The effect of thermal exposure under high vacuum conditions on the chemical composition of the surface layers of the VT6 alloy with mixed implantation of N+ ions by a carbon film is investigated. It is shown that under the conditions of thermal exposure, the change in the concentration profiles of the distribution of elements is determined by the processes of chemical interaction, in which the diffusion of carbon and nitrogen into deeper layers does not occur. On the contrary, their concentration decreases and this is due to the formation of volatile compounds CO, CO2 or (CH)2 under thermal exposure. Titanium in the surface analyzed layer is in an oxidized state with various degrees of oxidation. Up to a depth of about 10 nm, the oxidation state of titanium is Ti4+ and Ti3+, and in the transition region of the film/substrate is Ti2+.