Al/ZnSe͑100͒ Schottky barriers fabricated on c(2ϫ2), 2ϫ1, and 1ϫ1 reconstructed surfaces were studied by means of photoemission spectroscopy and first-principles calculations. Relatively similar values of the Schottky barriers were found for interfaces fabricated on Zn-stabilized c(2ϫ2) and Se-dimerized 2ϫ1surfaces, while substantially lower values of the p-type barriers were predicted theoretically and observed experimentally for junctions grown on the Se-rich 1ϫ1 surface. ͓S0163-1829͑98͒51716-X͔The possibility of tuning the Schottky-barrier height has been attracting attention since the inception of the study of metal/semiconductor junctions. 1 Recently, renewed interest has been stimulated by the contact problems that plague wide-band-gap semiconductors such as ZnSe and GaN. [2][3][4][5][6][7] We report experimental and theoretical studies of the Schottky barrier at Al/ZnSe͑100͒ interfaces showing that the barrier height is strongly dependent on the initial composition of the semiconductor surface. The observed experimental trend is that while the c(2ϫ2) and 2ϫ1 surface terminations correspond to similar barrier heights, a 0.25Ϯ0.05 decrease in the p-type barrier is found when the junction is fabricated on the Se-rich 1ϫ1 surface termination. The theoretical trend in the barrier is compellingly similar, i.e., junctions corresponding to the c(2ϫ2) and 2ϫ1 terminations are predicted to have relatively similar barrier heights ͑within 0.05 eV͒, while those obtained for the Se-rich 1ϫ1 surface are expected to have a lower p-type barrier, and specifically lower by 0.45Ϯ0.20 eV for the measured excess Se coverage of 0.41Ϯ0.18 ML of the 1ϫ1 relative to the 2 ϫ1 reconstruction. Our first-principles calculations for model interface configurations explain our experimental results in terms of a variable Se-induced local interface dipole.ZnSe epilayers ͑500 nm thick͒ were grown by molecularbeam epitaxy ͑MBE͒ on GaAs͑100͒. 8 All epilayers were Cl doped (nϳ1 -3ϫ10 18 cm Ϫ3 ). A thick Se cap layer was used to protect the samples during transfer in air to the photoelectron spectrometer. The Se cap layer was thermally desorbed in situ, and different surface reconstructions-as determined by reflection high-energy electron diffraction ͑RHEED͒-were obtained by varying the annealing conditions. Al overlayers 2-3 nm thick were evaporated in situ on ZnSe substrates kept at room temperature, with thickness determined using a quartz thickness monitor. Surfaces and interfaces were examined after quenching to room temperature by monochromatic x-ray photoemission spectroscopy ͑XPS͒ using Al K␣ radiation ͑1486.6 eV͒, an overall energy resolution ͑electron plus photons͒ of ϳ0.8 eV, and an effective photoelectron escape depth of ϳ1.5 nm, or by soft-x-ray synchrotron radiation photoemission spectroscopy ͑SRPES͒ at the Synchrotron Radiation Center of the University of Wisconsin-Madison, with an energy resolution of 0.2 eV.In Fig. 1 we show SRPES results for the Se 3d and Zn 3d core-level emission at a photon energy of 120 eV from surfaces exhi...