2001
DOI: 10.1016/s0022-3093(01)00890-0
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The structure of Na2O–Al2O3–SiO2 glass: impact on sodium ion exchange in H2O and D2O

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Cited by 152 publications
(161 citation statements)
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“…This behavior would apparently contradict the proposal of Grambow [22] in which the activity of silicic acid alone is assumed to control the dissolution rate of borosilicate glass. However, McGrail et al [25] argue that the non-linear behavior can be attributed to a secondary reaction mechanism, alkali ion exchange. Under dilute solution conditions (low silicic acid activities), sodium and boron rates are identical within experimental error, as can be seen in Figures 6 and 7.…”
Section: Solutions Doped With Simentioning
confidence: 99%
“…This behavior would apparently contradict the proposal of Grambow [22] in which the activity of silicic acid alone is assumed to control the dissolution rate of borosilicate glass. However, McGrail et al [25] argue that the non-linear behavior can be attributed to a secondary reaction mechanism, alkali ion exchange. Under dilute solution conditions (low silicic acid activities), sodium and boron rates are identical within experimental error, as can be seen in Figures 6 and 7.…”
Section: Solutions Doped With Simentioning
confidence: 99%
“…As a comparison, interlaced and noninterlaced mode using 2.0 keV O 2 + sputtering show~6 times difference in mass resolution and~560 times difference in signal intensity for the 28 Si + signal. Interlaced and noninterlaced mode using 2.0 keV Cs + sputtering show~7 times difference in mass resolution and~30 times difference in signal intensity for the 18 …”
Section: LImentioning
confidence: 99%
“…This advantage is especially important for deep depth profiling (e.g., ≥3 μm) because the measurement time is very long if Cs + or O 2 + sputtering is used. In Table 2, the signal intensity and mass resolution of the 28 Si + or 18 O -peak with non-interlaced mode 20 keV Ar n + sputtering is only slightly (5%-15%) better than that from interlaced mode. This means that with interlaced mode 20 keV Ar n + sputtering, the charge compensation is very effective, though it may not be as good as that with noninterlaced mode.…”
Section: LImentioning
confidence: 99%
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