1950
DOI: 10.1364/josa.40.000203
|View full text |Cite
|
Sign up to set email alerts
|

The Structure of Evaporated Metal Films and Their Optical Properties

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

8
130
0
6

Year Published

1956
1956
2016
2016

Publication Types

Select...
9

Relationship

0
9

Authors

Journals

citations
Cited by 403 publications
(146 citation statements)
references
References 20 publications
8
130
0
6
Order By: Relevance
“…Silver thin films of 50 nm thicknesses, previously determined to be optimal for SPs excitation [28], were deposited on standard microscope glass slides using two methods, electroless plating [28], and thermal evaporation [29]. Different deposition conditions, in particular deposition rates, were used for the thermal evaporation to vary the surface roughness of the deposited silver films [29].…”
Section: Silver Film Fabricationmentioning
confidence: 99%
“…Silver thin films of 50 nm thicknesses, previously determined to be optimal for SPs excitation [28], were deposited on standard microscope glass slides using two methods, electroless plating [28], and thermal evaporation [29]. Different deposition conditions, in particular deposition rates, were used for the thermal evaporation to vary the surface roughness of the deposited silver films [29].…”
Section: Silver Film Fabricationmentioning
confidence: 99%
“…§ 124. thae experimental work on fluorescence [164][165][166][167][168][169] has been carried out : by using islands formed [170][171] The fluorescence intensity has a peak as a function of film thickness…”
mentioning
confidence: 99%
“…A low substrate temperature generally reduces surface diffusion of Ag atoms, and thus alters the nucleation processes. 72 Presland et al 73 defined induction time t i as the time at which the void density increases in the film during an isothermal anneal for a given film thickness; it is related to the activation energy E ai of void formation as …”
Section: Low-temperature Depositionmentioning
confidence: 99%