The structure of an RF-magnetron sputter-deposited silicate-containing hydroxyapatite-based coating investigated by high-resolution techniques

Bioceramic Coatings for Metallic Implants

“…A novel Si-doped HA-based coating, in which the silicate ions are substituted by phosphorous ions, was fabricated [99][100][101]. Moreover, the precursor powder of Si-HA (Ca 10 (PO 4 ) 6-x (SiO 4 ) x (OH) 2-x , where x = 0.5 and 1.72) or Ag-HA (Ca 10Àx Ag x (PO 4 ) 6 (OH) 2Àx , where x = 0.3 and 1.5) was used for the deposition of the Si-or Ag-doped HA films [102].…”

“…The resulting HA, Ag-HA, and Si-HA powders exhibited an average particle size of 70 nm [101,103]. The investigations of the precursor powders and targets for sputtering were previously described [100,101,103].…”

“…The resulting HA, Ag-HA, and Si-HA powders exhibited an average particle size of 70 nm [101,103]. The investigations of the precursor powders and targets for sputtering were previously described [100,101,103]. It is very important to note that, in the case of Si-HA powder containing 1.22 and 4.9 at.% of Si, the preparation of the target resulted in the formation of the CaP phases HA and tricalcium phosphate (TCP), as determined by X-ray powder diffraction [100,101].…”

“…The investigations of the precursor powders and targets for sputtering were previously described [100,101,103]. It is very important to note that, in the case of Si-HA powder containing 1.22 and 4.9 at.% of Si, the preparation of the target resulted in the formation of the CaP phases HA and tricalcium phosphate (TCP), as determined by X-ray powder diffraction [100,101]. Based on the obtained XRD, TEM, and HRTEM results, it can be concluded that the applied target preparation procedure in case of the Ag-doped HA nanostructured powder allows to obtain a precursor material with two uniformly distributed phases: HA and metallic silver [103].…”

Testing the in vitro performance of hydroxyapatite coated magnesium (AZ91D) and titanium concerning cell adhesion and osteogenic differentiation

“…By plasma modification it is possible to introduce thin n-HA coatings that may be beneficial to thicker plasmasprayed coatings [24]. Sputtering offers the potential to produce dense and uniform coatings on metallic, ceramic or polymeric substrates [25]. Moreover, it allows the preparation of the coatings < 1 μm thick with controlled microstructure which reduces the risk of third-body wear and subsequent osteolysis [24].…”