The structure and photocatalytic activity of TiO2 thin films deposited by dc magnetron sputtering

Nanoscale TiO2 films and their application in remediation of organic pollutants

“…Fig. 8 A c c e p t e d M a n u s c r i p t sputtering, using a ceramic TiO 2 target in an argon gas environment [152]. The deposited film contained more spherical particles and had a nearly-homogenous structure, with relatively small grain size and thickness ranging between 400-800 nm.…”

Properties of TiO2 films deposited on flexible substrates using direct current magnetron sputtering and using high power impulse magnetron sputtering

“…A commercially available hot-pressed and sintered ceramic TiO 2 disc (99.995% purity Elecmat, USA) with a 52 mm diameter and a 6 mm thickness was used as the sputtering target. TiO 2 ceramic targets can be used in dcMS, provided they have reasonable electrical conduction [16]. The TiO 2 oxide targets are a semiconductor, having a sufficient conductivity of about 0.32 U-cm as a target for dcMS [17].…”

Effects of processing conditions on the physico-chemical characteristics of titanium dioxide ultra-thin films deposited by DC magnetron sputtering

“…During the last few years, titanium dioxide (TiO 2 ) thin films have been frequently used mainly because of their excellent photocatalytic and optical properties and also high thermal and chemical stabilities [1][2][3][4][5][6]. These properties and the exceptional electrical properties of TiO 2 made it more attractive for investigation [7].…”