2004
DOI: 10.1016/j.tsf.2004.04.018
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The structure and electrical conductivity of vacuum-annealed WO3 thin films

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Cited by 126 publications
(74 citation statements)
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“…The conductivity is calculated from the experimentally determined resistance R, which is monitored during the three heating and cooling cycles. The activation energy of conduction, E A , was frequently interpreted using the Arrhenius equation between 300 and 700 K. Our results are compatible with the principle results of conductivity of WO 3−x thin films [19][20][21][22][23][24][25][26]. It is obtained from the following formula:…”
Section: Resultssupporting
confidence: 86%
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“…The conductivity is calculated from the experimentally determined resistance R, which is monitored during the three heating and cooling cycles. The activation energy of conduction, E A , was frequently interpreted using the Arrhenius equation between 300 and 700 K. Our results are compatible with the principle results of conductivity of WO 3−x thin films [19][20][21][22][23][24][25][26]. It is obtained from the following formula:…”
Section: Resultssupporting
confidence: 86%
“…In WO 3−x NPs with CS phases, we suppose that the conductivity of tungsten oxide NPs is governed by the non-stoichiometry of WO 3 considered as n-type semiconductor and assumed that the non-stoichiometry originates only from oxygen vacancies of WO 6 octahedral. The conductivity curve exhibits a slope similar to the one obtained for annealing WO 3 thin films in low oxygen pressure [19][20][21][22][23]. This indicates that the NPs keep the same structure characterized by a high density of oxygen vacancies [20][21][22][23][24].…”
Section: Resultssupporting
confidence: 58%
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“…3 are also known to display reactivity toward cyclohexane oxidation, although with lower efficiency 45 due to reduced lattice oxygen mobility. 46,47 In this case, we observed a simplified spectrum of spin adducts moving from MoO 3 to WO 3 including a reduced overall intensity accompanied by complete disappearance of the parent C 6 H 11 · radical for the latter catalyst, which is considered responsible for the initiation step for this reaction ͑Fig. 10͒.…”
Section: Initiationmentioning
confidence: 85%