2002
DOI: 10.1016/s0022-3093(02)01373-x
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The structural transformation and properties of spin-on poly(silsesquioxane) films by thermal curing

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Cited by 73 publications
(30 citation statements)
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References 13 publications
(17 reference statements)
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“…Two significant changes are observed in Fig 2 as the MSSQb transforms to the MSSQF : the disappearance of the SiOH absorption band at 890 cm −1 and the reduced cage/network structural ratio at 1000– 1150 cm −1 by thermal curing. That the cage structure is transformed to the network structure by thermal curing has been reported previously 21–25. The characteristic polyimide peaks of CO stretching (1776 and 1722 cm −1 ) and CN stretching (1380 cm −1 ) are shown in the spectrum of PI1K , which indicated the complete imidization reaction.…”
Section: Resultssupporting
confidence: 76%
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“…Two significant changes are observed in Fig 2 as the MSSQb transforms to the MSSQF : the disappearance of the SiOH absorption band at 890 cm −1 and the reduced cage/network structural ratio at 1000– 1150 cm −1 by thermal curing. That the cage structure is transformed to the network structure by thermal curing has been reported previously 21–25. The characteristic polyimide peaks of CO stretching (1776 and 1722 cm −1 ) and CN stretching (1380 cm −1 ) are shown in the spectrum of PI1K , which indicated the complete imidization reaction.…”
Section: Resultssupporting
confidence: 76%
“…Silsesquioxanes with a well‐defined nanoscale size have been used as an inorganic moiety for hybrid materials 17–20. They have been regarded as a new class of low dielectric constant materials or optical waveguide materials 21–25. However, polysilsesquioxanes could exhibit unacceptable cracking propagation in film processing.…”
Section: Introductionmentioning
confidence: 99%
“…However, the ATR‐FTIR spectra for films with GPTMS pretreated using H 2 O for 4, 12, and 14 d showed no difference regardless of GPTMS pretreatment time. On the other hand, after 12 d of pretreatment with 0.1 m HCl, the peak at 1105 cm −1 increased in intensity, leading to a sharp peak for films deposited after 14 d. The peak at 1105 cm −1 is representative of the stretching mode of an Si–O–Si bond, suggesting that not only is more GPTMS present in the film, but that it is also present in the form of an organosilicate network . Furthermore, for the film deposited with 14 d of 0.1 m HCl pretreatment, a sharp peak at 910 cm −1 appears, which is attributed to unopened epoxide rings …”
Section: Resultsmentioning
confidence: 98%
“…Then volatilization of highly symmetric low molecular weight molecules comprising cage/open cage structures evaporation of the elements non yet linked into the network by crosslinking reactions [3,6], leading to a random network-like structure [7,8].…”
Section: Introductionmentioning
confidence: 99%
“…In their works, Wei-Chih Liu et al[7] identifies in the Silres MK FTIR spectra characteristic peaks for Si-CH 3 , Si-OH and more interesting, succeed to distinguish and explain Si-O-Si forming cage structure and Si-O-Si forming random network. The cleavage of the Si-CH 3 bond results in the collapse of the cage structure and then the formation of the dense Si-O-Si network structure.…”
mentioning
confidence: 99%