The state of the art in multicolor visible photolithography

Λιάρος, Νικόλαος; Tomova, Zuleykhan; Razo, Sandra A. Gutierrez; Cohen, S.; Fourkas, John T.; Wolf, Steven; Thum, Matthew D.; Falvey, Daniel E.; Ogden, Hannah M.; Mullin, Amy S.; Pranda, Adam; Oehrlein, Gottlieb S.; Petersen, John S.

doi:10.1117/12.2297653

Cited by 3 publications

(4 citation statements)

References 24 publications

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“…To implement the 1CL method, benzil was introduced as a photoinitiator for chemical reaction initiating polymerization when molecules are excited to a higher level of T n . [31,32] The wavelength near 525 nm was selected in the method based on the groundstate extinction, triplet excitation spectra (Figure S2, Supporting Information) and previous reports. [33,34] This is because there is no ground-state extinction absorption above 500 nm wavelength, whereas there is triplet excitation absorption near 525 nm wavelength.…”

Section: Resultsmentioning

confidence: 99%

“…To further improve spatial resolution, Fourkas group [ 26–28 ] proposed an approach to introduce the three color (3CL) instead of the 2CL process, making the probability of polymerization proportional to the cube of the light intensity while retaining the inhibition mechanism. An excitation color excites the molecule to its first singlet state, a second color of light then takes the molecule to the active state to initiate chemistry, and a third color of light, introduces reverse intersystem crossing back into the singlet manifold at a longer wavelength than the second color, quenching the excitation and returning the molecule to the ground state.…”

Section: Introductionmentioning

confidence: 99%

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Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

Ding,

Liu,

Liu

et al. 2023

Laser & Photonics Reviews

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Improving the 3D resolution is a decisive step in the transition of direct laser writing from being limited to research use to being a powerful tool. Three‐color (3CL) lithography is expected to result in significantly higher resolution with two‐color lasers initiating polymerization in two steps and one‐color laser inhibiting polymerization. However, the 3CL process increases the complexity of the system and makes the influence of chromatic aberration worse which leads to non‐ideal writing results, which is ≈80 nm linewidth (≈λ/10) at present. In this study, the 3CL lithography is improved by introducing almost one color (1CL) instead of three colors to achieve subdiffraction 3D nanolithography based on two‐photon two‐step absorption and photoinhibition (T2A‐PI). Using benzil as a photoinitiator, a sub‐30 nm (<λ/17.5) lateral feature size, minimum 80 nm lateral, and 160 nm axial pitches are achieved, which, to our knowledge, is the best to be fabricated using the laser in the visible region. 3D woodpile photonic crystals and other high‐quality nanostructures are fabricated, demonstrating the unique advantages over existing direct laser writing technologies.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

Ding,

Liu,

Liu

et al. 2023

Laser & Photonics Reviews

View full text Add to dashboard Cite

show abstract

“…In the 3-color scheme, the state that is inhibited requires the excitation light to trigger the polymerization, thus eliminating the competition between photoinhibition and polymerization. [106][107][108][109][110] By introducing a time delay between the PA and A states as shown in Figure 7f, sufficient photoinhibition could be realized. The 3color scheme is promising to provide a higher resolution than the aforementioned mechanisms, but the photoresists that have shown 3-color behavior to date [106,110] are required to be further optimized.…”

Section: -Color Scheme (Figure 7f)mentioning

confidence: 99%

“…[106][107][108][109][110] By introducing a time delay between the PA and A states as shown in Figure 7f, sufficient photoinhibition could be realized. The 3color scheme is promising to provide a higher resolution than the aforementioned mechanisms, but the photoresists that have shown 3-color behavior to date [106,110] are required to be further optimized.…”

Section: -Color Scheme (Figure 7f)mentioning

confidence: 99%

3D Sub‐Diffraction Printing by Multicolor Photoinhibition Lithography: From Optics to Chemistry

Zhang

Cao

et al. 2021

Laser & Photonics Reviews

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Photoinhibition lithography (PIL) is a nanoscale fabrication technique that uses multicolor visible light to enable the printing of arbitrary 3D structures beyond the diffraction limit. Photoinhibition allows the control and confinement of the exposed region for photoinitiation during the photolithographic process, thus improving the resolution of existing lithographic techniques, such as direct laser writing. Because PIL enables super-resolution 3D printing, it has a multitude of applications. In this review, practical applications of PIL in the areas of photonics, data storage, and biotechnology are highlighted; in addition, its unique features are revealed. The theory and recent advances in PIL for sub-diffraction printing and high-throughput fabrication are also discussed. Besides, challenges and tentative solutions are discussed with the hope of providing a preliminary roadmap for technological breakthroughs in PIL to enable developments of resolution and throughput.

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Direct Wavelength-Selective Optical and Electron-Beam Lithography of Functional Inorganic Nanomaterials

et al. 2019

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Direct optical lithography of functional inorganic nanomaterials (DOLFIN) is a photoresist-free method for high-resolution patterning of inorganic nanocrystals (NCs) that has been demonstrated using deep UV (DUV, 254 nm) photons. Here, we expand the versatility of DOLFIN by designing a series of photochemically active NC surface ligands for direct patterning using various photon energies including DUV, near-UV (i-line, 365 nm), blue (h-line, 405 nm), and visible (450 nm) light. We show that the exposure dose for DOLFIN can be ∼30 mJ/cm2, which is small compared to most commercial photopolymer resists. Patterned nanomaterials can serve as highly robust optical diffraction gratings. We also introduce a general approach for resist-free direct electron-beam lithography of functional inorganic nanomaterials (DELFIN) which enables all-inorganic NC patterns with feature size down to 30 nm, while preserving the optical and electronic properties of patterned NCs. The designed ligand chemistries and patterning techniques offer a versatile platform for nano- and micron-scale additive manufacturing, complementing the existing toolbox for device fabrication.

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The state of the art in multicolor visible photolithography

Cited by 3 publications

References 24 publications

Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

3D Sub‐Diffraction Printing by Multicolor Photoinhibition Lithography: From Optics to Chemistry

Direct Wavelength-Selective Optical and Electron-Beam Lithography of Functional Inorganic Nanomaterials

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