The semi-conductor of ZnO deposited in reactive HiPIMS

Wang, Zhengduo; Li, Qian; Yang, L.; Liu, Zhongwei; Ouyang, Jiting; Chen, Qiang

doi:10.1016/j.apsusc.2019.07.154

Cited by 4 publications

(2 citation statements)

References 49 publications

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“…Several methods have been introduced to synthesize the ZnO thin films, such as chemical vapor deposition [ 10 ], molecular beam epitaxy [ 11 ], sol-gel [ 12 ], pulsed laser deposition [ 13 ], and High Power Impulse Magnetron Sputtering (HiPIMS) [ 14 ]. Among these processes, the HiPIMS technique is a potential approach for developing high-quality thin films due to high-density plasmas with excessive quantities of ionized species, high energy transfer functions, low duty cycles, and long pulse off periods that lead to a substantially lower total heat load to the substrate compared with other methods [ 15 , 16 , 17 ].…”

Section: Introductionmentioning

confidence: 99%

Insight on Photocatalytic and Photoinduced Antimicrobial Properties of ZnO Thin Films Deposited by HiPIMS through Thermal Oxidation

2022

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Zinc oxide thin films have been developed through thermal oxidation of Zinc thin films grown by high impulse power magnetron sputtering (HiPIMS). The influence of various sputtering power on thin film structural, morphological, photocatalytic, and antimicrobial properties was investigated. X-ray diffraction (XRD) analysis confirmed that the crystalline phase of ZnO thin films consists of a hexagonal wurtzite structure. Increasing the sputtering power will lead to intrinsic stress on thin films that promote whisker formation. In this study, whiskers were successfully developed on the thin films without precursors/catalysts and not thermally treated over the Zn melting point. This finding showed that the film phase structure and morphology are significantly affected by sputtering power. It was found that ZnO thin films exhibit high photocatalytic performance under UV irradiation (89.91%) of methylene blue after 300 min of irradiation. The antimicrobial activity on ZnO thin films showed significant inhibition activity (p < 0.05) against E. coli, S. aureus, and C. albicans. However, the whisker formation on ZnO thin films is not accessible to enhance photocatalytic and antimicrobial activity. This study demonstrates that the HiPIMS method through the thermal oxidation process can promote a good performance of ZnO thin films as photocatalyst and antimicrobial agents.

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Section: Introductionmentioning

confidence: 99%

Insight on Photocatalytic and Photoinduced Antimicrobial Properties of ZnO Thin Films Deposited by HiPIMS through Thermal Oxidation

2022

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“…The relatively recently developed high-power impulse magnetron sputtering (HiPIMS) technology has an important advantage in its high target ionization rate, which can improve the activity of the various species during the sputtering process [ 23 , 24 , 25 , 26 ]. In addition, due to the high instantaneous power density applied on the target, the energy of the incident species to the substrate is effectively increased, resulting in the formation of a denser and more uniform film, thereby reducing the carrier scattering and enhancing the carrier mobility [ 27 , 28 ]. To the best of our knowledge, no other groups have prepared ITZO films using HiPIMS technology.…”

Section: Introductionmentioning

confidence: 99%

In-Sn-Zn Oxide Nanocomposite Films with Enhanced Electrical Properties Deposited by High-Power Impulse Magnetron Sputtering

Sun

Chen

et al. 2021

Nanomaterials

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In-Sn-Zn oxide (ITZO) nanocomposite films have been investigated extensively as a potential material in thin-film transistors due to their good electrical properties. In this work, ITZO thin films were deposited on glass substrates by high-power impulse magnetron sputtering (HiPIMS) at room temperature. The influence of the duty cycle (pulse off-time) on the microstructures and electrical performance of the films was investigated. The results showed that ITZO thin films prepared by HiPIMS were dense and smooth compared to thin films prepared by direct-current magnetron sputtering (DCMS). With the pulse off-time increasing from 0 μs (DCMS) to 2000 μs, the films’ crystallinity enhanced. When the pulse off-time was longer than 1000 μs, In2O3 structure could be detected in the films. The films’ electrical resistivity reduced as the pulse off-time extended. Most notably, the optimal resistivity of as low as 4.07 × 10−3 Ω·cm could be achieved when the pulse off-time was 2000 μs. Its corresponding carrier mobility and carrier concentration were 12.88 cm2V−1s−1 and 1.25 × 1020 cm−3, respectively.

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Combined effects of electron doping and surface polarity on the ferromagnetism in Gd implanted polar ZnO wafers

Cheng

et al. 2023

Journal of Alloys and Compounds

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The semi-conductor of ZnO deposited in reactive HiPIMS

Cited by 4 publications

References 49 publications

Insight on Photocatalytic and Photoinduced Antimicrobial Properties of ZnO Thin Films Deposited by HiPIMS through Thermal Oxidation

Insight on Photocatalytic and Photoinduced Antimicrobial Properties of ZnO Thin Films Deposited by HiPIMS through Thermal Oxidation

In-Sn-Zn Oxide Nanocomposite Films with Enhanced Electrical Properties Deposited by High-Power Impulse Magnetron Sputtering

Combined effects of electron doping and surface polarity on the ferromagnetism in Gd implanted polar ZnO wafers

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