1999
DOI: 10.1051/jp4:1999810
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The role of the substrate surface area/reactor volume ratio in chemistry and kinetics of chemical vapor deposition

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Cited by 5 publications
(3 citation statements)
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“…However, the doubled surface area in the Felt II does not lead to a doubled bulk density than in the Felt I even during the initial stage of infiltration. Therefore, CVI is not controlled simply by the surface area, but also its [A/V] ratio, because a higher [A/V] ratio leads to a lower surface related deposition rate [15][16][17][18]13]. Bulk densities of the Felt I and II become very similar one another as the infiltration time above 90h.…”
Section: Results and Discussion 31 Densificationmentioning
confidence: 99%
“…However, the doubled surface area in the Felt II does not lead to a doubled bulk density than in the Felt I even during the initial stage of infiltration. Therefore, CVI is not controlled simply by the surface area, but also its [A/V] ratio, because a higher [A/V] ratio leads to a lower surface related deposition rate [15][16][17][18]13]. Bulk densities of the Felt I and II become very similar one another as the infiltration time above 90h.…”
Section: Results and Discussion 31 Densificationmentioning
confidence: 99%
“…Because of the significant amount of chemical reactions taking place during the deposition process, it is usually assumed to decrease the reactions number by the so-called simplified (reduced) reaction scheme. Here we use a simplified reaction scheme following the proposal of Becker and Hüttinger [44,54,55]. The proposal is based on the separation of chemical reactions in species classes established on the basis of similarities between the species.…”
Section: Chemical Reactions Schemementioning
confidence: 99%
“…, 6) are functions of the temperature. We define further the deposition rate constants through the gas reaction constants [39,40] …”
Section: Reaction Kineticsmentioning
confidence: 99%