1984
DOI: 10.1016/0022-3697(84)90120-3
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The role of free carbon in the transport and magnetic properties of boron carbide

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Cited by 43 publications
(17 citation statements)
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“…The problem with employing such bulk growth techniques for the specialized semiconductor device applications described above is that they require harsh fabrication conditions, demonstrate limited tunability, and tend to yield unfavorable electronic properties such as unacceptably high electrical conductivity. 26,27 It has been demonstrated [28][29][30][31][32][33][34] that the use of thin-film fabrication methods such as chemical vapor deposition or physical vapor deposition can produce B x C thin films that maintain robust mechanical, thermal, and chemical properties, while improving on electrical transport, electronic, and/or optical properties (e.g., resistivity and band gap), without having to resort to the extreme conditions required by traditional bulk growth techniques. In particular, the plasma-enhanced chemical vapor deposition (PECVD) of films from ortho-carborane (o-C 2 B 10 H 12 ), which typically yields amorphous hydrogenated boron carbide (a-B x C:H y ) when lower growth temperatures are used, has been shown to be suitable for producing films for device applications as well as conducive to tuning properties over a wide range.…”
mentioning
confidence: 99%
“…The problem with employing such bulk growth techniques for the specialized semiconductor device applications described above is that they require harsh fabrication conditions, demonstrate limited tunability, and tend to yield unfavorable electronic properties such as unacceptably high electrical conductivity. 26,27 It has been demonstrated [28][29][30][31][32][33][34] that the use of thin-film fabrication methods such as chemical vapor deposition or physical vapor deposition can produce B x C thin films that maintain robust mechanical, thermal, and chemical properties, while improving on electrical transport, electronic, and/or optical properties (e.g., resistivity and band gap), without having to resort to the extreme conditions required by traditional bulk growth techniques. In particular, the plasma-enhanced chemical vapor deposition (PECVD) of films from ortho-carborane (o-C 2 B 10 H 12 ), which typically yields amorphous hydrogenated boron carbide (a-B x C:H y ) when lower growth temperatures are used, has been shown to be suitable for producing films for device applications as well as conducive to tuning properties over a wide range.…”
mentioning
confidence: 99%
“…According to the analysis on the composition of the samples and the origin of graphite peak, we deemed that the most possible origin of FM ordering in the Al‐doped B 4 C system was due to the free carbon. Some work by others had investigated the role of free carbon in the form of graphite within the B x C y B C z F system, where x , y , and z represent the atomic percentage of boron, bound carbon, and free carbon, respectively . They claimed that the free carbon would affect the D.C. transport and magnetic properties of boron carbide, and reported that the principal feature of in electron spin resonance lines indicated a dominance of free carbon when its concentration was larger than 3.5%.…”
Section: Resultsmentioning
confidence: 99%
“…Depending on the processing conditions, carbon may come into boron carbide or be present as free carbon forming amorphous carbon or graphite phases. For instance, electric current transport is dominated by the graphite phase when crystalline boron carbide has a free carbon content larger than 5%, which is explained by the much lower graphite resistivity in comparison with that of B 4 C [13]. In a similar way, elastic properties of components determine the elastic behaviour of the whole material, with the typical inconvenience that small amounts of soft compound may worsen the hardness of the system.…”
mentioning
confidence: 94%