The role of ammonium citrate and dodecyl pyridinium chloride on chemical mechanical polishing relevant to SiO2 dielectric layer

Zhang, Xianglong; Meng, Ni; Li, Xianghui; Mei, Xukun; Yang, Luyao; He, Yangang

doi:10.1016/j.jmapro.2023.10.054

Journal of Manufacturing Processes

2023

DOI: 10.1016/j.jmapro.2023.10.054

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The role of ammonium citrate and dodecyl pyridinium chloride on chemical mechanical polishing relevant to SiO2 dielectric layer

Xianglong Zhang,

Ni Meng,

Xianghui Li

et al.

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2024

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The role of ammonium citrate and dodecyl pyridinium chloride on chemical mechanical polishing relevant to SiO2 dielectric layer

Cited by 3 publications

References 39 publications

Novel green chemical mechanical polishing by controlling pH values and redox reaction for achieving atomic surface of a nickel alloy

Novel green chemical mechanical polishing by controlling pH values and redox reaction for achieving atomic surface of a nickel alloy

Tailored electrostatic attraction force between anionic polymer and Si3N4 film in consecutive gate poly open CMP

Three anionic surfactants for corrosion inhibition in cobalt CMP: Research on validity and mechanism

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