“…In order to fabricate antireflective surfaces, more and more material scientists and engineers have devoted themselves to develop and experiment with various advanced nanofabrication techniques, such as electron‐beam lithography, nanoimprint lithography, holographic lithography, fast atom beam etching, colloidal lithography, reactive ion etching . Therefore, the ARS surfaces incorporating the high‐throughput, broadband, and quasi‐omnidirectional antireflective properties with different structures have been fabricated and characterized by many groups, such as paraboloid, nanotip, nanorod, nanopillar, nanograss, nanocone, pyramid texture, nanowall, etc.…”