Nanocrystalline diamond (NCD) films were produced by microwave plasmaenhanced chemical vapor deposition (MPECVD) using gas mixtures of Ar, H 2 , and CH 4 . The structural properties, electron emission, and electric discharge behaviors of the NCD films varied with H 2 flow rates during MPECVD. The turn-on field for electron emission at a pressure of 2.66 9 10 À4 Pa increased from 4.2 V lm À1 for the NCD films that were deposited using a H 2 flow rate of 10 cm 3 min À1 to 7 V lm À1 for films deposited at a H 2 flow rate of 20 cm 3 min À1 . The NCD film with a low turn-on field also induced low breakdown voltages in N 2 . The grain size and roughness of the NCD films may influence both the electron emission and the electric discharge behaviors of the NCD cathodes.