Abstract:Gate last approach has started to appear in the high performance applications since 45nm technoology node. Such approach has to leverage the extra metal CMP (chemical mechanical polising) to planarize the working function metal and form the metal gate. However, it's well known that the metal CMP itself is incapable of controlling the performance at bevel area. Even worse, coupled with the instability of CMP residua, the non-optimized litho EBR process and the side-effect of integraton scheme, this poses the ch… Show more
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