The REBL DPG: recent innovations and remaining challenges

Carroll, Allen; Grella, L.; Murray, Kirk; McCord, Mark A.; Petric, Paul; Tong, William M.; Bevis, Christopher F.; Lin, Shy-Jay; Yu, Tsung-Hsin; Huang, Tze-Chiang; Wang, T. P.; Wang, Wenchuan; Shin, Jaw‐Jung

doi:10.1117/12.2048528

Cited by 6 publications

(4 citation statements)

References 3 publications

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“…8,11,[15][16][17][18][19][20][21][22][23][24] Among the algorithms, BC4, 15 BGC3, 16 and CornerGray 17 were designed to compress grey-level EBL data with rectilinear patterns and right angles at corners. 8,11,[15][16][17][18][19][20][21][22][23][24] Among the algorithms, BC4, 15 BGC3, 16 and CornerGray 17 were designed to compress grey-level EBL data with rectilinear patterns and right angles at corners.…”

Section: Compression Algorithms Of Electron-beam Layout Datamentioning

confidence: 99%

“…8,[18][19][20][21][22][23][24] BC4 and BGC3 compress EBL data through context-based prediction, context-based block prediction, and block copy techniques. 8,24 Although these algorithms can achieve excellent compression performance, the decompression steps are complex, and expensive hardware accelerations are required to achieve sufficient decoding performance. 15,16 CornerGray first transforms the corner pixels of the polygon to 1 and the remaining pixels to 0.…”

Section: Compression Algorithms Of Electron-beam Layout Datamentioning

confidence: 99%

“…IMS, 4,5 MAPPER, 6,7 and KLA-Tencor 8,9 have designed MEBDW systems with massively parallel electron beams. In recent years, multiple electron-beam direct-write (MEBDW) systems that use massively parallel electronbeam emitters to achieve fast scanning and high WPH have gained popularity as the technologies of high-speed digital system and micro-electro-mechanical system have matured.…”

Section: Introductionmentioning

confidence: 99%

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Efficient layout data compression algorithm and its low-complexity, high-performance hardware decoder implementation for multiple electron-beam direct-write systems

Tang

Su²,

2015

J. Micro/Nanolith. MEMS MOEMS

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A lossless electron-beam layout (EBL) data compression algorithm, LineDiff Entropy v2.0, and its lowcomplexity, high-performance hardware decoder for multiple electron-beam direct-write lithography systems are proposed. The algorithm compares consecutive data scanlines and encodes the data based on the change/nochange of pixel values and the lengths of pixel sequences. Then, the compaction steps of data omission, merging, and encoding of consecutive long identical scanlines are applied. Unique short codes are assigned to data with high occurrence frequency. The hardware decoder is designed as three circuit blocks that perform entropy decoding, decompaction, and EBL data generation through parallel outputs. The results demonstrate that our algorithm can achieve excellent compression performance and that the hardware decoder can decompress data at very high data rates.

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Section: Compression Algorithms Of Electron-beam Layout Datamentioning

confidence: 99%

Section: Compression Algorithms Of Electron-beam Layout Datamentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Efficient layout data compression algorithm and its low-complexity, high-performance hardware decoder implementation for multiple electron-beam direct-write systems

Tang

Su²,

2015

J. Micro/Nanolith. MEMS MOEMS

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“…Yang and Savari 11,12 proposed the Corner2 algorithm and custom run-length encoding schemes to reduce the hardware complexity and improve the decoding speeds, and Chaudhary et al 13 modified this algorithm for proximity-corrected grayscale data. Carroll et al 14 implemented a variation of a Lempel-Ziv 15,16 data compression algorithm in the reflective electron beam lithography system. 17 We began to consider the impact of parallelism on aperture array multibeam mask writers in Refs.…”

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confidence: 99%

Parallel compression/decompression-based datapath architecture for multibeam mask writers

2017

J. Micro/Nanolith. MEMS MOEMS

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Multibeam electron beam systems will be used in the future for mask writing and for complementary lithography. The major challenges of the multibeam systems are in meeting throughput requirements and in handling the large data volumes associated with writing grayscale data on the wafer. In terms of future communications and computational requirements, Amdahl's law suggests that a simple increase of computation power and parallelism may not be a sustainable solution. We propose a parallel data compression algorithm to exploit the sparsity of mask data and a grayscale video-like representation of data. To improve the communication and computational efficiency of these systems at the write time, we propose an alternate datapath architecture partly motivated by multibeam direct-write lithography and partly motivated by the circuit testing literature, where parallel decompression reduces clock cycles. We explain a deflection plate architecture inspired by NuFlare Technology's multibeam mask writing system and how our datapath architecture can be easily added to it to improve performance.

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Pattern Generators for Reflective Electron-Beam Lithography (REBL)

Carroll¹

2015

Advances in Imaging and Electron Physics

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The REBL DPG: recent innovations and remaining challenges

Cited by 6 publications

References 3 publications

Efficient layout data compression algorithm and its low-complexity, high-performance hardware decoder implementation for multiple electron-beam direct-write systems

Efficient layout data compression algorithm and its low-complexity, high-performance hardware decoder implementation for multiple electron-beam direct-write systems

Parallel compression/decompression-based datapath architecture for multibeam mask writers

Pattern Generators for Reflective Electron-Beam Lithography (REBL)

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