1954
DOI: 10.1021/ja01637a038
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The Reaction of Fluorine with Titanium, Zirconium and the Oxides of Titanium(IV), Zirconium(IV) and Vanadium(V)1

Abstract: Vanadium was determined by precipitation with cupf erron,® Fluoride was determined by thorium nitrate titration after separation by distillation.9 The original sample was fused with sodium hydroxide, treated with water, filtered, and the filtrate distilled.

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Cited by 33 publications
(9 citation statements)
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“…Between 300 and 500 8C, increasing mass gains were recorded till the 35% stoichiometric value anticipated for the total conversion of ZrO 2 to ZrF 4 was observed at 525 8C. The 525 8C temperature condition coincides with the optimum conversion temperature reported by both Haendler et al [17] and Monnahela et al [13] on using fluorine as the fluorinating agent. At 300 and 350 8C there was a 1 and 4% mass gain, respectively, and the XRD revealed ZrO 2 as the major phase and phases of Zr 3 O 2 F 8 ( Fig.…”
Section: Resultssupporting
confidence: 80%
“…Between 300 and 500 8C, increasing mass gains were recorded till the 35% stoichiometric value anticipated for the total conversion of ZrO 2 to ZrF 4 was observed at 525 8C. The 525 8C temperature condition coincides with the optimum conversion temperature reported by both Haendler et al [17] and Monnahela et al [13] on using fluorine as the fluorinating agent. At 300 and 350 8C there was a 1 and 4% mass gain, respectively, and the XRD revealed ZrO 2 as the major phase and phases of Zr 3 O 2 F 8 ( Fig.…”
Section: Resultssupporting
confidence: 80%
“…The process is sensitive to the mass transport/reaction rate limited transition as well as electron-induced redissociation of the volatile byproducts, which has also been demonstrated for the XeF 2 –SiO 2 etching . Other relevant work on conventional fluorine-based titanium plasma etching suggests the mechanism of Ti–F etching is attributed to the reaction of fluorine radicals with titanium to form TiF x products, where progressive fluorine incorporation drives x toward the volatile product of TiF 4 . , Notably TiF 3 is a stable solid at room temperature.…”
Section: Introductionmentioning
confidence: 84%
“…It is also prepared by the hydrolysis of titanium triuorochloride, and from the reaction of aqueous or anhydrous hydrogen uoride with titanium dioxide. [22][23][24][25] It crystallizes with a cubic ReO 3 -type structure 24 and it is a solid up to 450 C, stable under air. 26 Titanium uorides or oxyuorides have not yet been thoroughly investigated as electrode materials because of the instability of TiF 4 under air and the low-related electrochemical performances of TiOF 2 .…”
Section: Introductionmentioning
confidence: 99%