The PSR effect of matching network in 8/100 MHz geometrically symmetrical capacitively coupled Ar plasma

Liu, Zhaohui; Yuan, Qianghua; Yin, Guiqin

doi:10.1063/5.0102194

Cited by 3 publications

(3 citation statements)

References 60 publications

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“…The contribution of the high-order harmonics to the electron density was also observed during a dual-frequency discharge when a harmonic of the lower frequency coincided with the higher frequency [14]. On the other hand, the enhanced high-order harmonics may worsen the discharge uniformity due to the electromagnetic standing wave effect [18,20].…”

Section: Introductionmentioning

confidence: 87%

“…Mussenbrock and Brinkmann proposed that the high-order harmonics may be more effectively excited under the plasma series resonance (PSR) condition, enhancing electron heating [4]. The electron heating effect was then extensively investigated either theoreti-cally [5][6][7][8][9][10][11][12] or experimentally [13][14][15][16][17][18][19] by other researchers. Yamazawa found the electron density significantly increased when the high-order harmonics were excited by the PSR [15].…”

Section: Introductionmentioning

confidence: 99%

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Abnormal transition of the electron energy distribution with excitation of the second harmonic in low-pressure radio-frequency capacitively coupled plasmas

YU 余,

LU 陆,

ZHANG 张

2024

Plasma Sci. Technol.

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The self-excited second harmonic in radio-frequency capacitively coupled plasma was significantly enhanced by adjusting the external variable capacitor. At a lower pressure of 3 Pa, the excitation of the second harmonic caused an abnormal transition of the electron energy probability function, resulting in abrupt changes in the electron density and temperature. Such changes in the electron energy probability function as well as the electron density and temperature were not observed at the higher pressure of 16 Pa under similar harmonic changes. The phenomena are related to the influence of the second harmonic on stochastic heating, which is determined by both amplitude and the relative phase of the harmonics. The results suggest that the self-excited high-order harmonics must be considered in practical applications of low-pressure radio-frequency capacitively coupled plasmas.

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Section: Introductionmentioning

confidence: 87%

Section: Introductionmentioning

confidence: 99%

Abnormal transition of the electron energy distribution with excitation of the second harmonic in low-pressure radio-frequency capacitively coupled plasmas

YU 余,

LU 陆,

ZHANG 张

2024

Plasma Sci. Technol.

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“…The external circuit has a significant impact on the breakdown process [29] and steady-state results [30] of CCP discharges, and is considered to be the main cause of voltage harmonics between the electrodes [31]. Impedance matching can optimize the transfer of power supplied by the generator to the plasma load and reduce the reflection of power.…”

Section: Introductionmentioning

confidence: 99%

Kinetic simulations of capacitively coupled plasmas driven by tailored voltage waveforms with multi-frequency matching

Yu,

Wu,

Yang

et al. 2024

Plasma Sources Sci. Technol.

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Impedance matching is crucial for optimizing plasma generation and reducing power reflection in capacitively coupled plasmas (CCP). Designing these matchings is challenging due to the varying and typically unknown impedance of the plasma, especially in the presence of multiple driving frequencies. Here, a computational design method for impedance matching networks (IMNs) for CCPs is proposed and applied to discharges driven by tailored voltage waveforms (TVW). This method is based on a self-consistent combination of particle in cell/Monte Carlo collision simulations of the plasma with Kirchhoff’s equations to describe the external electrical circuit. Two Foster second-form networks with the same structure are used to constitute an L-type matching network, and the matching capability is optimized by iteratively updating the values of variable capacitors inside the IMN. The results show that the plasma density and the power absorbed by the plasma continuously increase in the frame of this iterative process of adjusting the matching parameters until an excellent impedance matching capability is finally achieved. Impedance matching is found to affect the DC self-bias voltage, whose absolute value is maximized when the best matching is achieved. Additionally, a change in the quality of the impedance matching is found to cause an electron heating mode transition. Poor impedance matching results in a heating mode where electron power absorption in the plasma bulk by drift electric fields plays an important role, while good matching results in the classical α-mode operation, where electron power absorption by ambipolar electric fields at the sheath edges dominates. The method proposed in this work is expected to be of great significance in promoting TVW plasma sources from theory to industrial application, since it allows designing the required complex multi-frequency IMNs.

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Influence of Matching Network on the Discharge Characteristic of Dual—Frequency Capacitively Coupled Ar Plasma

Yuan,

Shan,

Yin

et al. 2024

Contrib. Plasma Phys

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This paper examines the impact of different type external matching networks on the discharge characteristics of dual‐frequency capacitively coupled plasma. A nonlinear global model is employed to analyze the discharge of dual‐frequency capacitively coupled argon plasma, with a low frequency of 8 MHz and 60 W and a high frequency of 100 MHz at 10–80 W. Discharge voltage waveforms, current waveforms, and emission spectra of the plasma were measured, while electron density and electron temperature were determined using the Boltzmann method. The electron density and electron temperature are utilized as input parameters for the nonlinear global model, while the plasma discharge is simulated with a fixed low‐frequency radio frequency (RF) source power (60 W) and a varied high‐frequency RF source power ranging from 10 to 80 W. The results indicate that the plasma discharge current, sheath capacitance, plasma resistance, plasma inductance, and the ratio of stochastic heating to Ohmic heating increase, while the sheath thickness decreases with increasing power. It is also found that the fundamental frequency current as well as 12th and 13th harmonic currents in the plasma are caused by the matching network and the nonlinear interaction between the sheath and the plasma. An optimal matching network can be designed to eliminate the effects of the harmonics and to meet industrial requirements for discharge uniformity.

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The PSR effect of matching network in 8/100 MHz geometrically symmetrical capacitively coupled Ar plasma

Cited by 3 publications

References 60 publications

Abnormal transition of the electron energy distribution with excitation of the second harmonic in low-pressure radio-frequency capacitively coupled plasmas

Abnormal transition of the electron energy distribution with excitation of the second harmonic in low-pressure radio-frequency capacitively coupled plasmas

Kinetic simulations of capacitively coupled plasmas driven by tailored voltage waveforms with multi-frequency matching

Influence of Matching Network on the Discharge Characteristic of Dual—Frequency Capacitively Coupled Ar Plasma

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