2021
DOI: 10.3390/nano11082038
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The Production of Carbon Nanofiber on Rubber Fruit Shell-Derived Activated Carbon by Chemical Activation and Hydrothermal Process with Low Temperature

Abstract: Recently, the conversion of biomass into carbon nanofibers has been extensively studied. In this study, carbon nanofibers (CNFs) were prepared from rubber fruit shell (RFS) by chemical activation with H3PO4, followed by a simple hydrothermal process at low temperature and without a vacuum and gas catalyst. XRD and Raman studies show that the structure formed is an amorphous graphite formation. From the thermal analysis, it is shown that CNFs have a high thermal stability. Furthermore, an SEM/TEM analysis showe… Show more

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Cited by 12 publications
(2 citation statements)
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“…To further explore the graphitization degrees, XRD spectra of the samples were employed to analyze the consequence of the controlled alignment of CB NPs on CNF microstructure. Figure 2e shows two broad peaks at 24 • and 43 • that were analogous to the diffraction planes of (002) and (100) in graphitic carbon [31]. CB-TX@CNF displayed a higher degree of crystallinity at (100) plane than pure CNF because of the well-aligned CB NPs that acted as catalytic points to induce more graphitization all over the structure [32].…”
Section: Resultsmentioning
confidence: 99%
“…To further explore the graphitization degrees, XRD spectra of the samples were employed to analyze the consequence of the controlled alignment of CB NPs on CNF microstructure. Figure 2e shows two broad peaks at 24 • and 43 • that were analogous to the diffraction planes of (002) and (100) in graphitic carbon [31]. CB-TX@CNF displayed a higher degree of crystallinity at (100) plane than pure CNF because of the well-aligned CB NPs that acted as catalytic points to induce more graphitization all over the structure [32].…”
Section: Resultsmentioning
confidence: 99%
“…The amorphous carbon hard mask (ACHM) has been applied to the fabrication of semiconductors, replacing the conventional SiO 2 or Si 3 N 4 hard mask due to its excellent physical properties and chemical stability. ACHM can be deposited using a variety of deposition methods, among which the plasma-enhanced chemical vapor deposition (PECVD) method has been widely used because of its high productivity, low cost, and tenability in terms of its film properties [5][6][7]. However, experimental studies focusing on the simultaneous optimization of the film step coverage and dry etching characteristics, using different parameters, have rarely been conducted and reported.…”
Section: Introductionmentioning
confidence: 99%