The pressure dependence of structure and composition of sputtered AlCrSiTiMoO high entropy thin film

Behravan, Nastaran; Farhadizadeh, Alireza; Ghasemi, Saeed; Khademi, Ahmad; Shojaei, Hojat; Ghomi, Hamid

doi:10.1016/j.jallcom.2020.156421

Cited by 14 publications

(5 citation statements)

References 101 publications

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“…The micro-combinatorial method allowed for the preparation of all 15 layers in one vacuum cycle and in one experiment. It ensured identical sputtering conditions for the strips in the UHV vacuum chamber, e.g., residual and Ar working gas pressures, and with regard to the type and amount of impurities in the system; these are key parameters for reproducibility, as they can significantly affect the properties of a coating [41]. This sample design greatly aided the determination of the system's mechanical properties via nanoindentation measurements.…”

Section: High Strength In Alcu Thin Filmsmentioning

confidence: 99%

Review on High-Throughput Micro-Combinatorial Characterization of Binary and Ternary Layers towards Databases

et al. 2023

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The novel, single-sample concept combinatorial method, the so-called micro-combinatory technique, has been shown to be suitable for the high-throughput and complex characterization of multicomponent thin films over an entire composition range. This review focuses on recent results regarding the characteristics of different binary and ternary films prepared by direct current (DC) and radiofrequency (RF) sputtering using the micro-combinatorial technique. In addition to the 3 mm diameter TEM grid used for microstructural analysis, by scaling up the substrate size to 10 × 25 mm, this novel approach has allowed for a comprehensive study of the properties of the materials as a function of their composition, which has been determined via transmission electron microscopy (TEM), scanning electron microscopy (SEM), Rutherford backscattering spectrometry (RBS), X-ray diffraction analysis (XRD), atomic force microscopy (AFM), spectroscopic ellipsometry, and nanoindentation studies. Thanks to the micro-combinatory technique, the characterization of multicomponent layers can be studied in greater detail and efficiency than before, which is beneficial for both research and practical applications. In addition to new scientific advances, we will briefly explore the potential for innovation with respect to this new high-throughput concept, including the creation of two- and three-component thin film databases.

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Section: High Strength In Alcu Thin Filmsmentioning

confidence: 99%

Review on High-Throughput Micro-Combinatorial Characterization of Binary and Ternary Layers towards Databases

et al. 2023

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“…Behravan et al [67] reported the preparation of AlSiTiCrMo oxide using unbalanced DCMS under a pressure effect, which was altered between 1 and 8 mTorr. The film obtained at 1 mTorr shows a morphology devoid of defect-free features.…”

Section: Deposition Ratementioning

confidence: 99%

“…However, in the case of the CrNbSiTiZr film, no effect on its crystal structure was observed [63]. Behraven et al summarized some HEFs prepared with different deposition parameters, revealing the formation of an amorphous structure [67]. According to various reports, substrate temperature, substrate bias and working pressure have no effect on the phase of different HEFs, except in the study reported by Khan et al, where a phase transformation of AlCoCrCu 0.5 FeNi from disordered to crystalline structure occurred by changing the pressure.…”

Section: Structurementioning

confidence: 99%

Recent Progress on High-Entropy Films Deposited by Magnetron Sputtering

2022

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High-entropy films (HEFs) are of considerable interest in surface engineering applications due to their superior properties, such as good corrosion resistance, good thermal stability and excellent high temperature oxidation. Recently, the scientific community has seen an increasing development of the multicomponent coatings, improving their properties compared to conventional films. Technically, different strategies have been exploited to fabricate HEFs. Magnetron-sputtered HEFs have made significant advancements in this field. HEFs have various applications given their interesting performances. This article overviews the development and the outcome of HEFs prepared using the magnetron sputtering technique. The classification of HEFs is reported. The effect of magnetron sputtering parameters on the microstructural, mechanical, electrochemical and thermal properties of HEFs is also discussed. Applications of HEFs are reported in the last section.

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“…Coating thickness and structure significantly impact performance, and parameters such as grain size and lattice orientation must be controlled during preparation [11][12][13] . Magnetron sputtering is a commonly used method for thin film preparation, but it can be challenging for high-entropy Ti-based coatings due to difficulties in preparing targets with multicomponent alloys, leading to problems such as compositional deviation, phase separation, and defects like cracking with increasing thickness [14][15][16][17][18] . examining the effects and mechanisms of high-entropy on their properties.…”

Section: Introductionmentioning

confidence: 99%

Preparation and investigation of high-temperature oxidation resistance of TiCrAlNbSi alloy coating on Ti-6Al-4V substrate

WANG,

LIU,

LIN

et al. 2023

Ninth International Conference on Mechanical Engineering, Materials, and Automation Technology (MMEAT 2023)

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TiCrAlNbSi alloy coating is a high-temperature corrosion-resistant material. This study investigates the method of preparing high-entropy TiCrAlNbSi alloy coating on Ti6Al4V substrate and evaluates its high-temperature oxidation performance. The experiment uses an alloy target and Si target magnetron sputtering method to prepare TiCrAlNbSi alloy coating, optimizes sputtering power and other process parameters, and characterizes the structure and high-temperature resistance of the coating. The results show that the coating is dense and uniform with smooth surface, and has the characteristics of high entropy composition. In the high-temperature oxidation test, the coating exhibited good oxidation resistance, and the oxide product was dense and uniform, without obvious peeling and falling off on the surface of the coating. In summary, the method of magnetron sputtering to prepare high-entropy TiCrAlNbSi alloy coating on Ti6Al4V substrate has good high-temperature oxidation performance and has application prospects.

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The pressure dependence of structure and composition of sputtered AlCrSiTiMoO high entropy thin film

Cited by 14 publications

References 101 publications

Review on High-Throughput Micro-Combinatorial Characterization of Binary and Ternary Layers towards Databases

Review on High-Throughput Micro-Combinatorial Characterization of Binary and Ternary Layers towards Databases

Recent Progress on High-Entropy Films Deposited by Magnetron Sputtering

Preparation and investigation of high-temperature oxidation resistance of TiCrAlNbSi alloy coating on Ti-6Al-4V substrate

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