1961
DOI: 10.1016/0029-554x(61)90193-8
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The preparation of thin self supporting boron films

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1965
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Cited by 28 publications
(2 citation statements)
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“…In effusion cell testing examples, tantalum crucibles have yielded the most promising results, 37 but the purity of films produced using this method has been credited to differing vapor pressures of pure boron and the tantalum boride contaminants within the bulk material. 38 Tantalum begins to form borides as experimental temperatures reach 2300 K, 39 indicating the possibility of contamination once the boron begins to melt.…”
Section: A Materials Considerations and Crucible Designmentioning
confidence: 99%
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“…In effusion cell testing examples, tantalum crucibles have yielded the most promising results, 37 but the purity of films produced using this method has been credited to differing vapor pressures of pure boron and the tantalum boride contaminants within the bulk material. 38 Tantalum begins to form borides as experimental temperatures reach 2300 K, 39 indicating the possibility of contamination once the boron begins to melt.…”
Section: A Materials Considerations and Crucible Designmentioning
confidence: 99%
“…Similar testing utilizing tungsten effusion cells resulted in appreciable contamination of thin films produced with indications that boron is actively attacking the tungsten material. 37 Work performed by Stroms et al states that tungsten effusion cells will form a protective layer of tungsten boride. However, experimental temperatures in this study did not reach the melting point of boron.…”
Section: A Materials Considerations and Crucible Designmentioning
confidence: 99%