2015
DOI: 10.1088/0953-8984/27/38/386001
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The predominance of substrate induced defects in magnetic properties of Sr2FeMoO6thin films

Abstract: A systematic study of epitaxially grown Sr2FeMoO6 thin films on SrTiO3, (LaAlO3)0.3(Sr2AlTaO6)0.7, SrLaAlO4 and MgO single crystal substrates were made. Transmission electron microscopy investigations showed sharp substrate/films interfaces and increased defect concentration with increased lattice mismatch, indicating defect formation such as dislocations, low angle grain boundaries and stacking faults as a strain relaxation mechanism. Large enough compressive mismatch cause the over-relaxation of the lattice … Show more

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Cited by 23 publications
(22 citation statements)
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“…[5]. The higher T C and reduced M s in tensile‐strained films suggest that tensile strain and interface defects promote the formation of oxygen vacancies . According to ref.…”
Section: Phase Stability and Point Defects In Sr2femoo6−δmentioning
confidence: 92%
See 3 more Smart Citations
“…[5]. The higher T C and reduced M s in tensile‐strained films suggest that tensile strain and interface defects promote the formation of oxygen vacancies . According to ref.…”
Section: Phase Stability and Point Defects In Sr2femoo6−δmentioning
confidence: 92%
“…In particular, it appeared during postdeposition cooling in an oxygen atmosphere . SrMoO 4 formation is favored by biaxial tensile film strains . During pulse laser deposition of thin films at 820 °C, over 850 °C, at 900 °C, and at 950 °C, decomposition of SFMO into SrMoO 4 and other oxides was obtained already at p O2 > 10 −2 Pa.…”
Section: Film Deposition Methodsmentioning
confidence: 99%
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“…This strain energy stored in the films grows as the film thickness increases and, when it becomes so large that relaxation becomes energetically favorable, it is released with the addition of dislocations or other structure defects in the film after a critical thickness value. 12,13 These defects impose serious limitations for technological applications since they will alter the transport/magnetic properties of SFMO films severely.…”
Section: Introductionmentioning
confidence: 99%