Abstract:The discovery of the ferroelectricity of HfO<sub>2</sub> in 2011 has opened up new avenues for the application of ferroelectric technology. With the stability of ferroelectricity in a few nm scales, HfO<sub>2</sub> has become a valuable material for the development of next-generation electronic memory devices. The unique structure of HfO<sub>2</sub> gives rise to various ferroelectric properties and behaviors that can be utilized in different types of devices such as ferroel… Show more
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