The possibilities of glow discharge cathode sputtering for laser atomic-fluorescence analysis of microelectronics materials

Grazhulene, S. S.; Хвостиков, В. А.; Sorokin, MV Mikhail

doi:10.1016/0584-8547(91)80052-5

Cited by 15 publications

(6 citation statements)

References 8 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In this regard, it is interesting to study the prospects for laser fluorescence, especially since the technical equipment used in the course of growing thin films by glow-discharge sputtering is analogous, in principle, to that which we have developed previously for laser atomic-fluorescence analysis of solid samples [10]. We propose using the previously developed technique for some in situ studies of the dependence on the partial gas pressures of the oxidation process for metals employed in the fabrication of high temperature superconductors (e.g., yttrium, zirconium, and zirconium-yttrium alloy) sputtered in glow discharges in argon and oxygen atmospheres.…”

mentioning

confidence: 98%

“…The emission spectrometer has a spectral range of 200-700 nm and a resolution of 0.1 nm. The atomizer is sputtering chamber in a glow discharge with a gas system and power supply described in [10]. The atomizer can operate in three regimes: pulsed, continuous, and quasicontinuous.…”

mentioning

confidence: 99%

“…Variations in the composition of the gaseous phase during sputtering of yttrium samples were identified and studied by changing the partial pressure of oxygen over the range from 1⋅10 -3 to 5⋅10 -1 Pa. The atomic emission fluorescence spectrometer described in [10] was used in the experiment. It measures the emission and fluorescence spectra simultaneously using a single atomizer.…”

mentioning

confidence: 99%

See 2 more Smart Citations

Gaseous phase monitoring during reactive sputtering of yttrium in glow discharges

Хвостиков

Grazhulene

2009

J Appl Spectrosc

View full text Add to dashboard Cite

543.42The emission and fluorescence spectra at wavelengths of 580-650 nm during sputtering of yttrium, zirconium, and their alloys are studied for the purpose of developing spectroscopic methods for monitoring the composition of the gaseous phase during cathode sputtering of these metals in glow discharges in oxygen-argon atmospheres. The 584.2, 585.9, 587.4; 613.2, 614.8, 616.5, 617.9; 647.1, 648.7, and 650.3 nm lines are identified as molecular lines of yttrium oxide. The corresponding electronic transition energies are calculated. A correlation is found between the behavior of the emission and fluorescence spectra of the gaseous phase within this wavelength range during sputtering of yttrium in glow discharges and changes in the concentration of the oxygen-argon mixture. The dependence of the fluorescence and emission line intensities of the yttrium oxide molecule on the partial pressure of oxygen is studied. Introduction.One of the important problems in microelectronics technology is the preparation of high purity films with various compositions and for different purposes by sputtering a target-sample (magnetron or cathode sputtering in glow discharges) with subsequent deposition of sputtered gas-phase molecules on a substrate. Sputtering can take place in a vacuum or in a reactive (e.g., oxygen) atmosphere. The properties of the resulting films depend on their stoichiometric composition and structural perfection, which, in turn, is determined by the composition of the gaseous phase and the sputtering conditions. Thus, films of intermediate vanadium oxide (VO 2 ) with thermochromism and a high temperature coefficient of electrical resistivity undergo a change in resistance by a factor of three when the concentration of oxygen in argon is changed by 1% [1]. The dielectric properties and surface morphology of laser deposited epitaxial Ba(Zr 0.3 Ti 0.7 )O 3 films depend substantially on the partial pressure of oxygen [2]. For the same reason, the phase composition and crystallite dimensions of zirconium oxide films change during film deposition [3]. Thus, finding optimum discharge conditions for creating a constant gaseous phase composition during sputtering-deposition processes means that the task of monitoring of this composition is extremely important.Various methods, direct and indirect, can be used for monitoring film deposition processes. The existing methods for direct in situ monitoring of the composition of sputtered films including x-ray structure analysis [4], x-ray photoelectron spectroscopy, Raman scattering [5], ellipsometry, pyrometry, etc.[6], require quite complicated and costly equipment. Therefore, in most cases indirect monitoring techniques are used, including the following: measuring the intensities of metal and oxygen emission lines [7], monitoring the cathode potential [8,9], measuring the IR optical absorption [6], measuring the partial pressure of oxygen in the vessel [1], and stabilizing the temperature [3] in correlation with the film quality. These monitoring techniques, however, do ...

show abstract

mentioning

confidence: 98%

mentioning

confidence: 99%

mentioning

confidence: 99%

See 1 more Smart Citation

Gaseous phase monitoring during reactive sputtering of yttrium in glow discharges

Хвостиков

Grazhulene

2009

J Appl Spectrosc

View full text Add to dashboard Cite

show abstract

“…A two-stage gas bleed system was used to feed the reactive gas into the atomizer. The presence of two stages and the stabilization of the gas pressure in the intermediate stage enabled the gas to be bled reproducibly into the system at pressures of 10 -2 -1 Pa. Fluorescence spectra of the glow discharge were measured using an improved atomic-fluorescence spectrometer with laser fluorescence excitation as described before [13,14]. Fluorescence was excited by radiation of an LZhI-504 tuned dye laser with pumping by a CL-7020 pulsed excimer laser (2 kW power, 20 ns pulse length, 0.05 nm emission spectral line width, 420-700 nm wavelength tuning without frequency doubling).…”

mentioning

confidence: 99%

“…The experimental set up included a magnetron-type glow discharge atomizer, a pumping system and fine gas bleed, and laser fluorescence and emission spectrometers. The atomizer described before [13,14] equipped additionally with a strong transverse magnetic-field source was used for sample sputtering. The plasma during magnetron sputtering was concentrated near the cathode×target surface owing to the magnetic system placed on the opposite side of the cathode.…”

mentioning

confidence: 99%

Laser-induced fluorescence monitoring of the gas phase in a glow discharge during reactive sputtering of vanadium

et al. 2011

View full text Add to dashboard Cite

Processes in the gas phase of a glow discharge during diode and magnetron reactive sputtering of vanadium in an Ar-O 2 atmosphere have been investigated by laser-induced fluorescence (LIF) as a function of the parameters of the glow discharge and the composition of the atmosphere. The intensity of the fluorescence spectra increased by 1.5-2.0 orders of magnitude in the magnetron sputtering process compared with that of diode sputtering. Under continuous sputtering conditions, the dependences of the intensities and relative compositions of the fluorescence spectra on the discharge parameters (discharge voltage and current) have been investigated. In pulsed mode of the glow discharge, the dynamics of changes in the spectra have been studied versus variations in the discharge duration and the lag time for recording the fluorescence signal. The dependence of the spectral line intensities on the partial pressure of oxygen has been found for vanadium and its oxide. The cathode surface at pressures of 0.03-0.04 Pa was shown to convert to the oxidized state.Keywords: laser-induced fluorescence spectroscopy, glow discharge, reactive diode and magnetron cathode sputtering, molecular spectra.Introduction. Cathode sputtering of solids in an electric glow discharge is a commonly used method in various applications such as direct analysis of solids and process sputtering of thin layers and films. A flux of sputtered material as dense as possible and corresponding as much as possible to the composition of the solid cathode must be generated in analytical applications in order to achieve highly sensitive determinations. A definite stoichiometric film composition must be ensured for the industrial preparation. For this, it is often necessary to add one of the material components to the discharge atmosphere (reactive sputtering). Thus, the composition and properties of the deposited films depend on the gas-phase composition that is determined to a large extent by the added components and the conditions of the cathode surface that change as the discharge parameters change. For example, films of vanadium dioxide change their electrical resistance by three times if the O 2 concentration in Ar changes by 1% [1]. The dielectric properties and surface morphology of epitaxial films of Ba(Zr 0.3 Ti 0.7 )O 3 during laser deposition [2] and the phase composition and crystallite size during sputtering of zirconium oxide films [3] depend on the partial pressure of O 2 . Thus, monitoring of the gas-phase composition during cathode sputtering in a glow discharge and studies of processes affecting the composition and occurring at the cathode surface as functions of changes in the sputtering parameters are critical problems from various viewpoints.Optical emission spectroscopy [4-10], mass spectrometry [5,11], and monitoring of the cathode potential [12] or O 2 partial pressure [1] are most often used to solve these problems. Thus, intensities of metal and gas (O 2 and N 2 ) emission lines were measured and conditions under which their ratio was ...

show abstract

Atomic Spectroscopy

Broekaert¹,

Evans²

2003

Ullmann's Encyclopedia of Industrial Chemistry

View full text Add to dashboard Cite

The possibilities of glow discharge cathode sputtering for laser atomic-fluorescence analysis of microelectronics materials

Cited by 15 publications

References 8 publications

Gaseous phase monitoring during reactive sputtering of yttrium in glow discharges

Gaseous phase monitoring during reactive sputtering of yttrium in glow discharges

Laser-induced fluorescence monitoring of the gas phase in a glow discharge during reactive sputtering of vanadium

Atomic Spectroscopy

Contact Info

Product

Resources

About