2001
DOI: 10.1080/01442350110071966
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The picture tells the story: Using surface morphology to probe chemical etching reactions

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Cited by 42 publications
(35 citation statements)
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“…(Lasaga and Lü ttge, 2004). Most programs are tailored to specific applications but some are more general (Cuppen et al, 2000(Cuppen et al, , 2002(Cuppen et al, , 2006Hines, 2001;van Veenendaal et al, 2002;Lasaga and Lü ttge, 2003). Our aim is to simulate the evolution of nuclear track etch pits in minerals.…”
Section: Simulationmentioning
confidence: 99%
“…(Lasaga and Lü ttge, 2004). Most programs are tailored to specific applications but some are more general (Cuppen et al, 2000(Cuppen et al, , 2002(Cuppen et al, , 2006Hines, 2001;van Veenendaal et al, 2002;Lasaga and Lü ttge, 2003). Our aim is to simulate the evolution of nuclear track etch pits in minerals.…”
Section: Simulationmentioning
confidence: 99%
“…Diffusion of silicon atoms and methoxylate adsorbates, redeposition of etched silicon from solution, and undercutting reactions were forbidden. The latter three assumptions are well justified for aqueous etching in the presence of alcohol, as discussed in refs .…”
Section: Experimental and Computationalmentioning
confidence: 87%
“…The rates of the site-specific reactions were user-controlled parameters that were determined by comparison to experimental morphologies. ,, On the basis of previous investigations of the reactivity of H/Si(111) in a variety of solutions, ,, five different reactive sites were included in the simulation: kinks, points, dihydride-terminated steps, monohydride-terminated steps, and terrace sites. Two additional reactive sites which must exist at least transiently during etching, trihydrides and strained horizontal dihydrides, have never been observed experimentally and were assumed to etch immediately upon formation.…”
Section: Experimental and Computationalmentioning
confidence: 99%
“…(Lasaga and Lüttge 2004). Most programs are tailored to specific applications but some are more general (Cuppen et al, 2000;2002;2006;Hines, 2001;van Veenendaal et al, 2002, Lasaga andLüttge, 2003). Our aim is to simulate the evolution of nuclear track etch pits in minerals.…”
Section: Simulationmentioning
confidence: 99%