The Photopolymer Science and Technology Award

Abstract

. He joined Electrotechnical Laboratory (one of the predecessors of AIST) in 1982 and he was long engaged on micro-and nanofabrication using focused ion or electron beams. He has been focusing on nanofabrication by UV nanoimprint since 2000 and invented a UV nanoimprint method using a condensable gas. He advanced his research through the JST-CREST research project "Research and development on process science and CD control in high-throughput nanoimprint" (2008)(2009)(2010)(2011)(2012)(2013)(2014) proposed by Prof. Shinji Matsui. He currently tries to apply UV nanoimprint lithography in MEMS fabrications.