The photoelectron spectrum of boron trifluoride

Bassett, P. J.; Lloyd, D. R.

doi:10.1039/c29700000036

Cited by 23 publications

(15 citation statements)

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“…Figure 1 may show the high energy tail of the capture peak. The remainder of the ionization efficiency curve shows much structure and processes corresponding to reactions such as [2] or [5] could not be identified. The onset occurring at --6 eV is at much too low an energy to correspond to [2].…”

Section: F'mentioning

confidence: 99%

“…Photoelectron spectroscopy has been used to study PF, (1)(2)(3)(4)(5), other Group V halides (5-9), hydrides (3,(8)(9)(10)(11) and PF,-containing complexes of Ni and Pt (2,12) and Cr, Fe, and Rh (1 3). Electron impact appearance potentials have been measured for NF, (14), PH, (15)(16)(17)(18)(19)(20), PCI, (21)(22)(23), PBr, (24), PI, (25), AsCl, (7,23,26), SbC1, (23), ASH, (15,26,27), SbH,, BiH, (15), and Ni and Co complexes containing PF, (28,29).…”

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confidence: 99%

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Energetics of the Ionization and Fragmentation of Phosphorus Trifluoride by Electron Impact

Torgerson¹,

Westmore²

1975

Can. J. Chem.

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Relative intensities and appearance potentials of several positive ions in the mass spectrum of PF3 are reported as well as an ionization efficiency curve for F−, the only negative ion of significant intensity. Probable ion fragmentation pathways are proposed, together with heats of formation of some positive ions, and ionization potentials for PF3, PF2·, and PF. The results are compared with available data for other Group V halides.

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Section: F'mentioning

confidence: 99%

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confidence: 99%

Energetics of the Ionization and Fragmentation of Phosphorus Trifluoride by Electron Impact

Torgerson¹,

Westmore²

1975

Can. J. Chem.

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“…In the second model, Figure 3b, the exposed lamellar facet is its width, which is assumed to be of the order of up to ∼1000 nm. 18 However, the (typical) SFM image in Figure 4b, taken at 50-60 µm away from the fiber surface, reveals oval objects with maximal thicknesses of 200 nm which can possibly be correlated with the widths of the exposed lamellar facets. This would make the lamellar width as much as five times thinner than conventionally presumed.…”

Section: Discussionmentioning

confidence: 96%

Nanoscale Shear and Indentation Measurements in Transcrystalline α-Isotactic Polypropylene

2001

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The relation between the mechanical properties and the lamellar morphology of the R-isotactic polypropylene transcrystalline interphase in a fiber composite was investigated by means of nanometric shear and directional indentation measurements, using scanning force microscopy. Measurements were performed along directions parallel and perpendicular to the transcrystalline growth direction.A key finding is the inversion of the shear modulus anisotropy ratio from 2.3 to 0.5 as the crystal grows away from the fiber. On the basis of this finding, an improved view of the hierarchical lamellar and molecular order of the transcrystalline layer is proposed.

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“…The CND0/2 calculations can obviously cause considerable confusion in the assignment of p.e. spectra, (8,11,29,32,33) if these effects are not taken into account. …”

Section: Discussionmentioning

confidence: 99%

Photoelectron Spectra and Bonding in Some Halosilanes

Frost¹,

Herring²,

Katrib³

et al. 1971

Can. J. Chem.

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The photoelectron spectra of some halosilanes, SiB,X (X = F, C1, Br), SiH2X2 (X = F, CI), and SiHC1, have been studied, to obtain information on the bonding, especially (p -+ d)x back-bonding to silicon. The spectra were assigned on simple orbital overlap grounds, by comparison with the carbon analogues and by use of CWDO/2 calculations. Few discrepancies were found, but in these cases the first method was preferred. There is ample evidence from the individual ionization potentials and by comparison of the spectra with those of the analogous carbon compounds for interaction of the halogen pn: electrons with the silicon d orbitals. This is also indicated by some empirical calculations on the chlorosilanes, which also confirm the assignment of the spectra.It can also be shown that the ionization potentials are consistent with the silicon-halogen o bond strength decreasing through the series H3SiF > H3SiC1 > H,SiBr.Les spectres photo6lectroniques de quelques halosilanes SiHJ (X = F, Cl, Br), SiH2X, ( X = F, GI), et SiHC1, ont permis d'etudier le mode de liaison au silicium et plus particulibrement le renforcement de la liaison n(p + d). Les spectres sont attributs en considerant le simple recouvrement des orbitales par comparaison avec les analogues du carbone et en utilisant les calculs CND0/2. Bien que les resultats soient peu divergents, on prefere dans ces cas, utiliser la premiere methode. L9interaction entre les electrons pn: des halogenes et les orbitales d du silicium, est fortement mise en evidence par les potentiels d'ionisation individuels et par comparaison avec les spectres des composis analogues du carbone. Elle est montree aussi par quelques calculs empiriques qui confirment egalement l'attribution de spectres.I1 est aussi possible de montrer que les potentiels d'ionisation sont en accord avec !a force de la liaison entre le silicium et l'halogene, qui decroit dans la stquence: H3SiF > H3SiCI > H,SiBr.

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The photoelectron spectrum of boron trifluoride

Cited by 23 publications

References 1 publication

Energetics of the Ionization and Fragmentation of Phosphorus Trifluoride by Electron Impact

Energetics of the Ionization and Fragmentation of Phosphorus Trifluoride by Electron Impact

Nanoscale Shear and Indentation Measurements in Transcrystalline α-Isotactic Polypropylene

Photoelectron Spectra and Bonding in Some Halosilanes

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