1990
DOI: 10.1007/bf02673332
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The oxidation of titanium silicide

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Cited by 37 publications
(9 citation statements)
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“…According to the phase diagram, there exist two eutectics at 1330 • C, including a Ti-rich eutectic consisting of 86 at.% Ti and a Si-rich eutectic corresponding to 84 at.% Si. There is also a phase transformation occurring at 865 • C. The compound Ti 5 Si 3 has been extensively investigated as a potential material for high temperature structural applications, due to its high * Corresponding author. Tel.…”
Section: Introductionmentioning
confidence: 99%
“…According to the phase diagram, there exist two eutectics at 1330 • C, including a Ti-rich eutectic consisting of 86 at.% Ti and a Si-rich eutectic corresponding to 84 at.% Si. There is also a phase transformation occurring at 865 • C. The compound Ti 5 Si 3 has been extensively investigated as a potential material for high temperature structural applications, due to its high * Corresponding author. Tel.…”
Section: Introductionmentioning
confidence: 99%
“…Among these silicides, the compound of Ti 5 Si 3 has been considered as a promising material for high-temperature structural applications, in view of its high melting temperature (2130 • C), low density (4.32 g/cm 3 ), good strength at elevated temperatures, excellent creep resistance, and high oxidation resistance [1][2][3]. In addition, titanium disilicide (TiSi 2 ) is a popular candidate used for the Si interconnects in the electronic industry because of its low electrical resistivity and high thermal stability [4].…”
Section: Introductionmentioning
confidence: 99%
“…Its properties provide the desirable combination of a high melting temperature (2403 K), good strength at high temperature, good creep resistance, low density (4.32 g/cc), and high oxidation resistance [1][2][3]. However, as in the case of many intermetallic compounds, the current concern about this material focuses on its low fracture toughness (2.5 Mpa.…”
Section: Introductionmentioning
confidence: 97%