We observed rotational anisotropy of optical second harmonic generation (SHG) from V-shaped chromium nanohole arrays with 150 nm arm-length, 50 nm width, 360 nm periodicity, 120 o apex angle, and an area of 100 µm 2 , fabricated by electron beam lithography. Phenomenological analysis indicated that the effective nonlinear susceptibility element χ ଷଵଷ (ଶ) had a characteristic contribution to the observed anisotropic SHG intensity patterns. Here coordinate 1 is in the direction of the tip of V shapes in the substrate plane, and 3 indicates the direction perpendicular to the sample surface. The SHG intensity for the S-polarized output light was very weak, probably due to cancellation effect by the image dipoles created at the metal-air boundary. The possible origin of the observed nonlinearity was discussed according to the susceptibility elements obtained.2