The nanostructuring of surfaces and films using interference lithography and chalcogenide photoresist

Abstract

The reversible and transient photostimulated structural changes in annealed chalcogenide glass (ChG) layers were used to form interference periodic structures on semiconductor surfaces and metal films. It was shown that negative-action etchants based on amines dissolve illuminated parts of a chalcogenide film, i.e., act as positive etchants. The diffraction gratings and 2-D interference structures on germanium ChGs -more environmentally acceptable compounds than traditionally used arsenic chalcogenides -were recorded, and their characteristics were studied.