Abstract:During the exposure process of a step-and-scan lithography, the transitional time between continuous scans does not produce production efficiency in which no scanning occurs. To minimize the transitional time and therefore to improve the productivity we introduce the motion-overlap scheme, which inserts a step-move between the overrun phase and the phase before exposure of next field along the scanning direction for wafer stage during the continuous exposure process. The simulation results show that the motion… Show more
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