2006
DOI: 10.1117/12.696259
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The microstructure and LIDT of Nb 2 O 5 and Ta 2 O 5 optical coatings

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Cited by 8 publications
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“…To produce test layers of TiO 2 , Nb 2 O 5 , and Ta 2 O 5 with high refractive index and low absorption, we began depositing these materials reactively with IAD under the following conditions: 3 and 4 Å/s, 200 0 C chamber temperature, 400 V ion beam voltage, 600 mA ion beam current, IAD discharge gas composed of 45 sccm O 2 and neutralizer gas composed of 7 sccm argon, and varying levels of oxygen back pressure. However, these settings did not yield refractive indices as high as reported by Abromavicius et al for Nb 2 O 5 and Ta 2 O 5 [5], and we did not achieve a refractive index as high as 2.4 for TiO 2 , which we had produced in our previous study depositing TiO 2 from Ti metal [4].…”
Section: Resultscontrasting
confidence: 76%
“…To produce test layers of TiO 2 , Nb 2 O 5 , and Ta 2 O 5 with high refractive index and low absorption, we began depositing these materials reactively with IAD under the following conditions: 3 and 4 Å/s, 200 0 C chamber temperature, 400 V ion beam voltage, 600 mA ion beam current, IAD discharge gas composed of 45 sccm O 2 and neutralizer gas composed of 7 sccm argon, and varying levels of oxygen back pressure. However, these settings did not yield refractive indices as high as reported by Abromavicius et al for Nb 2 O 5 and Ta 2 O 5 [5], and we did not achieve a refractive index as high as 2.4 for TiO 2 , which we had produced in our previous study depositing TiO 2 from Ti metal [4].…”
Section: Resultscontrasting
confidence: 76%
“…To produce test layers of TiO 2 , Nb 2 O 5 , and Ta 2 O 5 with high refractive index and low absorption, we began depositing these materials reactively with IAD under the following conditions: 3 and 4 Å∕s, 200°C chamber temperature, 400 V ion beam voltage, 600 mA ion beam current, IAD discharge gas composed of 45 sccm O 2 and neutralizer gas composed of 7 sccm argon, and varying levels of oxygen back pressure. However, these settings did not yield refractive indices as high as reported by Abromavicius et al 13 for Nb 2 O 5 and Ta 2 O 5 , and we did not achieve a refractive index as high as 2.4 for TiO 2 , which we had produced in our previous study depositing TiO 2 from Ti metal. 10 In order to at least replicate the high refractive index results achieved by Abromavicius et al, we pursued their lower deposition rate of 1 Å∕s and did not use oxygen back pressure.…”
Section: Resultscontrasting
confidence: 73%