The microhardness, electrical conductivity and temperature coefficient of resistance of reactively sputtered TiCxOyNz films

Fark, H.; Chevallier, J.; Reichelt, K.; Dimigen, H.; Hübsch, H.

doi:10.1016/0040-6090(83)90276-6

Cited by 10 publications

(4 citation statements)

References 14 publications

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“…The N intensity increased gradually from the substrate towards to the film surface, while other elements, such as Ti and O, almost remained constant through the film depth. This agreed with the report on a trace of N contamination which originated from the sputtering atmosphere [13]. The higher N intensity was believed to be the effect of higher sputtering power applied for preparing Bc2 sample and the same for the Bc6.…”

Section: Microstructural and Optical Propertiessupporting

confidence: 92%

Characteristics of Visible-Light Enabled TiO2/ITO Films

Hung

Yeh

et al. 2011

AMR

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Three types of visible-light enabled titanium oxide (TiO2) films deposited on indium tin oxide (ITO) substrates at different levels of doping nitrogen (N) and carbon (C) and sputtering power are investigated for their capabilities to both pollution control and splitting water on hydrogen production. All samples are similar in morphological and microstructural features, but differ in their interfacial phase and dopants. For the N,C-codoped TiO2 film prepared at a higher sputtering power, tin ions can permeate into the growing TiO2 film from the ITO substrate and promote the formation of crystalline Ti1-xSnxO2 layer. It shows the highest photocatalytic oxidation rate over methylene blue (MB) solution under ultraviolet and blue light irradiation, respectively. This is ascribed to the photosensitized carbon on the columnar grains, leading an increase in the MB adsorption capacity and light harvesting efficiency. Conversely, the N-TiO2 film prepared at a lower power exhibits the highest photocurrent density and hydrogen yield rate of which a higher Schottky barrier formed at the TiO2/ITO interface. This suggests that the interfacial properties of TiO2/ITO film and C-doping truly control its photocatalytic capabilities in addition to the well-known surface states.

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Section: Microstructural and Optical Propertiessupporting

confidence: 92%

Characteristics of Visible-Light Enabled TiO2/ITO Films

Hung

Yeh

et al. 2011

AMR

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show abstract

“…The N intensity increased gradually from the substrate towards to the film surface, while other elements, such as Ti and O, almost remained constant through the film depth. This agreed with the report on a trace of N contamination which originated from the sputtering atmosphere [18]. The higher N intensity was believed to be the effect of higher sputtering power applied for preparing Bc2 sample and the same for the Bc6.…”

Section: Micro Structural and Optical Propertiessupporting

confidence: 92%

Structural Characteristics and Photocatalytic Capabilities of Visible-Light Enabled Columnar TiO2 Films

Hung

Chang

et al. 2010

AMM

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Visible-light enabled titanium oxide (TiO2) films deposited on indium tin oxide (ITO) substrates are investigated for their capabilities to both pollution control and splitting water on hydrogen production. Three types of TiO2 films are prepared at different levels of doping nitrogen (N) and carbon (C) and sputtering power. All three samples are similar in morphological and microstructural features, but differ in their interfacial phase and dopants. For the N,C-codoped TiO2 film prepared at a higher sputtering power, tin ions can permeate into the growing TiO2 film from the ITO substrate and promote the formation of crystalline Ti1-xSnxO2 layer. It shows the highest photocatalytic oxidation rate over methylene blue (MB) solution under ultraviolet and blue light irradiation, respectively. This is ascribed to the photosensitized carbon on the columnar grains, leading an increase in the MB adsorption capacity and light harvesting efficiency. Conversely, the N-TiO2 film prepared at a lower power exhibits the highest photocurrent density of which a higher Schottky barrier formed at the TiO2/ITO interface. A hydrogen yield rate of 0.25 μmol/cm2 h is obtained under blue light irradiation. These suggest that the interfacial properties of TiO2/ITO film and C-doping truly control its photocatalytic capabilities in addition to the well-known surface states.

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“…Hence, the considerable decline in the hardness of the V as -TiO 2 film was caused by the incorporation of a small amount of N and C atoms into the TiO 2 lattice, as revealed by Fark et al [49]. We believe that the shift in the preferential orientation from the (1 0 1) to the (2 1 1) plane, revealed by the XRD patterns in Fig.…”

Section: Elastic Modulus and Nanohardnessmentioning

confidence: 84%

“…These suggested that Ti-C bond formed by substituting oxygen for carbon, while C-N bond and/or C-C bond free in graphitic nature were present in the TiO 2 lattices by codoping N and C atoms. In other words, a compound of TiO 2ÀxÀy N x C y was formed analogous to the TiC x O y N z films prepared by RF sputtering TiC target in an Ar-O 2 -N 2 atmosphere [49]. By adopting this method, the amount of C relative to Ti in the bulk TiO 2 was tremendously reduced from a reported value >16.2% [49] to 1.3%, while the N/C ratio of the C-N bond remained fairly low at about 0.22.…”

Section: Xps Measurementsmentioning

confidence: 99%

Characterization of N,C-codoped TiO2 films prepared by reactive DC magnetron sputtering

Hung

2009

Applied Surface Science

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The microhardness, electrical conductivity and temperature coefficient of resistance of reactively sputtered TiCxOyNz films

Cited by 10 publications

References 14 publications

Characteristics of Visible-Light Enabled TiO<sub>2</sub>/ITO Films

Characteristics of Visible-Light Enabled TiO<sub>2</sub>/ITO Films

Structural Characteristics and Photocatalytic Capabilities of Visible-Light Enabled Columnar TiO<sub>2</sub> Films

Characterization of N,C-codoped TiO2 films prepared by reactive DC magnetron sputtering

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