The Low Electrical Resistivity of the High-entropy Alloy Oxide Thin Films

Tsau, Chun-Huei; Yang, Yi-Ju; Lee, Cheng-Che; Wu, Lyu-Yi; Huang, Hou-Jun

doi:10.1016/j.proeng.2012.03.037

Cited by 29 publications

(11 citation statements)

References 8 publications

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“…The resistivity of the thin films all decreased after annealing because of recrystallizing and eliminating of defects. We found this interesting phenomenon first in the TFCNO film; the resistivity of as-annealed TFCNO film was lower than that of the TiFeCoNi bulk alloy [1,2]. Therefore, we further designed the other alloys to study this phenomenon.…”

Section: Resultsmentioning

confidence: 92%

“…This study deals with the room-temperature resistivity of alloy oxide thin films. In our previous study on the highentropy alloy, TiFeCoNiO film had an extremely low resistivity (∼35 Ω-cm) at room temperature [1,2]. The value is almost close to that of metallic alloy, and it broke our concept that the alloy oxides had higher resistivity.…”

Section: Introductionmentioning

confidence: 81%

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The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiO_xHigh-Entropy Alloy Oxide Thin Films

Tsau

Hwang

Chen

2015

Advances in Materials Science and Engineering

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The (Al, Cr, Ti)FeCoNi alloy thin films were deposited by PVD and using the equimolar targets with same compositions from the concept of high-entropy alloys. The thin films became metal oxide films after annealing at vacuum furnace for a period; and the resistivity of these thin films decreased sharply. After optimum annealing treatment, the lowest resistivity of the FeCoNiOx, CrFeCoNiOx, AlFeCoNiOx, and TiFeCoNiOxfilms was 22, 42, 18, and 35 μΩ-cm, respectively. This value is close to that of most of the metallic alloys. This phenomenon was caused by delaminating of the alloy oxide thin films because the oxidation was from the surfaces of the thin films. The low resistivity of these oxide films was contributed to the nonfully oxidized elements in the bottom layers and also vanishing of the defects during annealing.

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Section: Resultsmentioning

confidence: 92%

Section: Introductionmentioning

confidence: 81%

The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiO_xHigh-Entropy Alloy Oxide Thin Films

Tsau

Hwang

Chen

2015

Advances in Materials Science and Engineering

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“…was between 10% and 50%. Tsau et al [102] deposited the amorphous Ti x FeCoNi, TiFeCoNiCu x , and Al x CrFeCoNiCu thin films by sputtering. After being oxidized during annealing, all the oxide films transformed to the FCC structure with very low electrical resistivity.…”

Section: Hea Nitride Oxide and Carbide Films And Coatingsmentioning

confidence: 99%

“…Compared with the HEA films, their oxide films present the different electrical performance. Tsau et al [102] found the low electrical resistivity of TiFe-CoNi, TiFeCoNiCu, and AlCrFeCoNiCu oxide thin films. Huang et al [101] deposited the oxide films of AlCoCrCu 0.5 NiFe by a RF-sputtering system.…”

Section: Physical Characteristicsmentioning

confidence: 99%

Microstructures and properties of high-entropy alloy films and coatings: a review

Liu

Liaw

2018

Materials Research Letters

406

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In the past 14 years, as a branch of high-entropy alloy (HEA) materials, HEA films and coatings have exhibited the attractive and unique properties, relative to the conventional film and coating materials. The recent research and development of HEA films and coatings are reviewed in this paper. At first, the basic concept of HEAs films and coatings are introduced. Then, their preparation technologies, microstructures and appealing properties are summarized. Moreover, the possible reasons and design criteria for achieving the excellent properties are discussed. Finally, the suggested future research work for the HEA films and coatings are outlined. IMPACT STATEMENT Preparation technologies, microstructures, and properties of HEA films and coatings are reviewed in this paper. The design criteria and suggested research directions are further discussed and proposed.

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“…Some researchers have studied the electrophysical and magnetic properties of high-entropy oxide phases [3,5,6,13,16,17]. It was shown that Ti x FeCoNiO y films have extremely low-electrical resistance values [17]. Some authors [3] declared an exceptionally high value of the dielectric constant of materials formed by Mg, Co, Ni, Cu, Zn, Li, and Ga oxides.…”

Section: Introductionmentioning

confidence: 99%

Extremely Polysubstituted Magnetic Material Based on Magnetoplumbite with a Hexagonal Structure: Synthesis, Structure, Properties, Prospects

et al. 2019

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Crystalline high-entropy single-phase products with a magnetoplumbite structure with grains in the μm range were obtained using solid-state sintering. The synthesis temperature was up to 1400 °C. The morphology, chemical composition, crystal structure, magnetic, and electrodynamic properties were studied and compared with pure barium hexaferrite BaFe12O19 matrix. The polysubstituted high-entropy single-phase product contains five doping elements at a high concentration level. According to the EDX data, the new compound has a formula of Ba(Fe6Ga1.25In1.17Ti1.21Cr1.22Co1.15)O19. The calculated cell parameter values were a = 5.9253(5) Å, c = 23.5257(22) Å, and V = 715.32(9) Å3. The increase in the unit cell for the substituted sample was expected due to the different ionic radius of Ti/In/Ga/Cr/Co compared with Fe3+. The electrodynamic measurements were performed. The dielectric and magnetic permeabilities were stable in the frequency range from 2 to 12 GHz. In this frequency range, the dielectric and magnetic losses were −0.2/0.2. Due to these electrodynamic parameters, this material can be used in the design of microwave strip devices.

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The Low Electrical Resistivity of the High-entropy Alloy Oxide Thin Films

Cited by 29 publications

References 8 publications

The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiO_xHigh-Entropy Alloy Oxide Thin Films

The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiO_xHigh-Entropy Alloy Oxide Thin Films

Microstructures and properties of high-entropy alloy films and coatings: a review

Extremely Polysubstituted Magnetic Material Based on Magnetoplumbite with a Hexagonal Structure: Synthesis, Structure, Properties, Prospects

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The Low Electrical Resistivity of the High-entropy Alloy Oxide Thin Films

Cited by 29 publications

References 8 publications

The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiOxHigh-Entropy Alloy Oxide Thin Films

The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiOxHigh-Entropy Alloy Oxide Thin Films

Microstructures and properties of high-entropy alloy films and coatings: a review

Extremely Polysubstituted Magnetic Material Based on Magnetoplumbite with a Hexagonal Structure: Synthesis, Structure, Properties, Prospects

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The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiO_xHigh-Entropy Alloy Oxide Thin Films

The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiO_xHigh-Entropy Alloy Oxide Thin Films