2005
DOI: 10.1016/j.surfcoat.2005.02.043
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The influence on the plasma and the coating caused through a combination of steered arc and modified pulsed arc processes

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Cited by 4 publications
(2 citation statements)
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“…The base current avoided the extinction of the arc between two peaks. It was shown, that the modified pulsed arc evaporation reduces the risk of droplet formation compared to the random arc evaporation and enables a higher deposition rate and less droplets using large base current durations at a low current value and short peak current durations at high peak current compared to the DC arc evaporation [20,21,22]. In this work, the base current was I = 60 A for t = 1 s and the peak current was I = 100 A for t = 1 ms.…”
Section: Page 7 Of 40mentioning
confidence: 99%
“…The base current avoided the extinction of the arc between two peaks. It was shown, that the modified pulsed arc evaporation reduces the risk of droplet formation compared to the random arc evaporation and enables a higher deposition rate and less droplets using large base current durations at a low current value and short peak current durations at high peak current compared to the DC arc evaporation [20,21,22]. In this work, the base current was I = 60 A for t = 1 s and the peak current was I = 100 A for t = 1 ms.…”
Section: Page 7 Of 40mentioning
confidence: 99%
“…A magnetic field during the basic current phase is required to keep the spots on a defined trace and perform an accelerated movement. The diversion of the spots in the pulse current phase should however not be disturbed by a magnetic field 6. Therefore, the magnetic field is synchronised to the arc current only to be active in the base current phase.…”
Section: Introductionmentioning
confidence: 99%