The Influence of the Addition of a Third Element on the Structure and Mechanical Properties of Transition-Metal-Based Nanostructured Hard Films: Part I—Nitrides

Cavaleiro, A.; Trindade, B.; Vieira, M. Teresa

doi:10.1007/978-0-387-48756-4_7

Cited by 10 publications

(4 citation statements)

References 137 publications

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“…It is seen that the V content increased from 0.31 to 0.65 when the V sputtering current was increased from 0.4 to 1.0 A whereas the N content remained constant at a value of approximately 1.28. The constant of N content in the films is due to the low N affinity of V atom that led to less incorporation of N atoms in the films [22]. The N/(Ti + V) ratio is more than 1 suggested that all the films prepared in this study showed over-stoichiometry.…”

Section: Chemical Compositionmentioning

confidence: 75%

Effects of Vanadium Content on Structure and Chemical State of TiVN Films Prepared by Reactive DC Magnetron Co-Sputtering

Deeleard¹,

Chaiyakun²,

Pokaipisit³

et al. 2013

MSA

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TiVN films were deposited on Si(100) wafers without external heating and biasing by reactive dc magnetron co-sputtering. Titanium and vanadium metals were used as sputtering targets. Ar and N₂ gases were used as sputtering gas and reactive gas, respectively. The flow rates of Ar and N₂ were 8 and 4 sccm, respectively. The Ti sputtering current (I_Ti) was kept constant at 0.6 Aand V sputtering current (I_V) was varied from 0.4 to1.0 A. The deposition time for all the deposited films was 30 min. The effects of V sputtering current on the structure, surface and cross-sectional morphologies, and chemical composition and chemical state of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and field emission scanning electron microscopy (FE-SEM), and X-ray photoelectron spectroscopy (XPS), respectively. It was found that all the prepared film formed (Ti,V)N solid solution. The lattice parameter was found to decrease while crystallite size, RMS roughness and film thickness increased with increasing V sputtering current. High resolution XPS spectra of the Ti 2p, V 2p and N 1s revealed that the fraction of Ti-N and V-N bonds increased as the V sputtering current increased. However, the V-N bond was observed only at a high V sputtering current.

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Section: Chemical Compositionmentioning

confidence: 75%

Effects of Vanadium Content on Structure and Chemical State of TiVN Films Prepared by Reactive DC Magnetron Co-Sputtering

Deeleard¹,

Chaiyakun²,

Pokaipisit³

et al. 2013

MSA

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“…In addition, the N content in all the films also increased with increasing Ti even though the N 2 flow rate was kept constant at 6.0 sccm. This result may be explained by the fact that the N affinity of Ti is higher than that of Cr atom (ΔH TiN = −337.65 kJ/mol, ΔH CrN = −117.15 kJ/mol [21]) that led to more incorporation of N atom in the films [22]. The ratio of nitrogen to metals ( ) was less than 1 revealing that all of the films were small understoichiometry which could be attributed to the effect of Ar + bombardment on preferential removal of nitrogen by surface cleaning process before XPS analysis [23].…”

Section: Resultsmentioning

confidence: 99%

“…It was also noticed that the (111) peak intensity of XRD patterns increased with increasing Ti . This result could be attributed to the increasing of film thickness and the higher energy of ion bombardment which resulted in an increase in crystallinity of the films [22].…”

Section: Structuralmentioning

confidence: 99%

Growth and Characterization of Nanostructured TiCrN Films Prepared by DC Magnetron Cosputtering

Paksunchai

Denchitcharoen

Chaiyakun

et al. 2014

Journal of Nanomaterials

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Nanostructured TiCrN films were grown on Si (100) wafers by reactive DC unbalanced magnetron cosputtering technique without external heating and voltage biasing to the substrates. The effects of Ti sputtering current on the chemical composition, chemical state, electronic structure, crystal structure, and morphology of the TiCrN films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), atomic force microscopy (AFM), and field emission scanning electron microscopy (FE-SEM), respectively. The results showed that all prepared films were formed as an understoichiometric (Ti, Cr)N solid solution with the fcc B1 type phase. The films exhibited a nanostructure with a crystallite size of less than 14 nm. The deconvolution of XPS spectra revealed the chemical bonding between Ti, Cr, N, and O elements. The addition of Ti contents led to the decrease of valence electrons filled in the d conduction bands which result in the change of binding energy of electrons in core levels. The roughness of the films was found to increase with increasingITi. The cross-sectional morphology of the films showed columnar structure with dome tops.

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“…In this state, two processes can be produced and contribute to reach the maximum in mechanical properties of the film: (i) according to Carter et al [69] the surface diffusional relaxation process leads to maximise neighbour bonding between atoms, whereas the decrease in the interatomic distance was related to the covalent band gap in an inversely proportional way. The higher energy of the covalent bonding led to stronger interatomic forces and contributes to the improvement in film hardness [70]; (ii) the second process is the reduction of the fraction of grain boundary voids, thereby strengthening the grain boundaries mechanism [46]. Finally, the result is the improvement of the hardness of (TiN + Cr 2 N) structure by the densification of the film and strengthening mechanism of the grain boundaries.…”

Section: Mechanical Propertiesmentioning

confidence: 99%

Effect of Ar/N2 flow ratio on the microstructure and mechanical properties of Ti-Cr-N coatings deposited by DC magnetron sputtering on AISI D2 tool steels

Kehal¹,

Saoula²,

Abaidia³

et al. 2021

Surface and Coatings Technology

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Ti-Cr-N coatings were deposited on Si (100) and AISI D2 tool steel substrates by reactive DC magnetron cosputtering technique from titanium and chromium target in mixed Ar/N 2 atmosphere. The Ar/N 2 ratio effects on the chemical composition, structure, morphology, intrinsic stress and mechanical properties of the Ti-Cr-N coatings were investigated. The growing process of Ti-Cr-N coatings can be divided into three stages: Stage I, in poisoning mode (low flow ratio 1 < Ar/N 2 ≤ 1.4), Stage II, in transition mode (intermediate flow ratio 1.4 ≤ Ar/N 2 ≤ 3) and Stage III in metallic mode (Ar/N 2 > 3). For all samples, XRD analysis shown the formation of mixed nitrides phases. In stage I, Ti 2 N, TiN 0.3 , and hexagonal-Cr 2 N phases were observed. In Stage II, TiN 0.3 , Cr 2 N, and cubic-TiN phases were formed, while only TiN and Cr 2 N are observed in stage III. The coatings deposited with Ar/N₂ ratio of 3 shows the largest hardness of 24 GPa which is attribute to the dense structure and smoother surface morphology. The properties of the films are discussed in terms of evolution growth stages resulting by the variation of Ar/N 2 flow ratios.

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The Influence of the Addition of a Third Element on the Structure and Mechanical Properties of Transition-Metal-Based Nanostructured Hard Films: Part I—Nitrides

Cited by 10 publications

References 137 publications

Effects of Vanadium Content on Structure and Chemical State of TiVN Films Prepared by Reactive DC Magnetron Co-Sputtering

Effects of Vanadium Content on Structure and Chemical State of TiVN Films Prepared by Reactive DC Magnetron Co-Sputtering

Growth and Characterization of Nanostructured TiCrN Films Prepared by DC Magnetron Cosputtering

Effect of Ar/N2 flow ratio on the microstructure and mechanical properties of Ti-Cr-N coatings deposited by DC magnetron sputtering on AISI D2 tool steels

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