2001
DOI: 10.1016/s0022-2313(01)00206-x
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The influence of Si-doping to the growth rate and yellow luminescence of GaN grown by MOCVD

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Cited by 23 publications
(15 citation statements)
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“…Due to the substitution of Si dopants in gallium lattice sites, an increase in the Si-doping concentration can reduce the number of gallium vacancies. Similar phenomena are also been observed in previous reports [8,9].…”
Section: Article In Presssupporting
confidence: 92%
“…Due to the substitution of Si dopants in gallium lattice sites, an increase in the Si-doping concentration can reduce the number of gallium vacancies. Similar phenomena are also been observed in previous reports [8,9].…”
Section: Article In Presssupporting
confidence: 92%
“…However, by increasing the input current the yellow band emission rapidly saturated and its proportion to QW emission decreased to negligible level, which can be seen from the high injection measurement. Possible causes for yellow luminescence are shallow dopants in n-GaN, [18][19][20] carbon impurities in i-GaN (Refs. [21][22][23] or gallium vacancy complexes in i-GaN.…”
mentioning
confidence: 99%
“…In addition, the other external impurities such as O and C were also may take part to the formation of yellow luminescence. 23 …”
Section: Resultsmentioning
confidence: 99%