1988
DOI: 10.1002/sia.740110903
|View full text |Cite
|
Sign up to set email alerts
|

The influence of oxygen on the thermal mixing of Cr and GdxOy thin films

Abstract: Thin films of Cr and Gd oxide were sequentially deposited on Kapton H polyimide and heat treated in vacuum or air at 550-673 K. The interactions between the layers was followed with Auger electron spectroscopy and Rutherford back-scattering spectrometry. Heating caused the Cr oxide thickness to grow as a function of thermal exposure. No intermixing occurred between the Cr and Gd,O, layers until the presence of 0 in the Cr layer near the interface. Rapid diffusion of Cr oxide into the Gd oxide layer then occurr… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 13 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?