The Influence of Lattice Mismatch on Indium Phosphide Based High Electron Mobility Transistor (HEMT) Structures Observed in High Resolution Monochromatic Synchrotron X-Radiation Diffraction Imaging
Abstract:The formation of mismatch dislocations in layered semiconductor structures was found recently in high resolution monochromatic synchrotron x-radiation diffraction images to be correlated with characteristics of the substrate as well as with the layer thickness and degree of lattice mismatch of non pseudomorphic layers.1,2 We have now extended these studies to examine the accommodation to strain as a function of lattice mismatch in a series of high electron mobility transistor (HEMT) structures grown by molecul… Show more
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