The influence of boron contents on the microstructure and mechanical properties of Cr–B–N thin films

Effect of Nitrogen Content on Microstructures and Mechanical Properties of WB2(N) Films Deposited by Reactive Magnetron Sputtering

“…It indicates that h-BN is generated in the films deposited at P N2 = 0.04 Pa. Note that no obvious peaks are found in other films (not shown here), which is similar to the case of Cr-B-N films [25] . increasing P N2 , which agrees well with the SEM morphology.…”

Effect of Boron and Oxygen on the Structure and Properties of Protective Decorative Cr–Al–Ti–N Coatings Deposited by Closed Field Unbalanced Magnetron Sputtering (CFUBMS)

“…Max hardness (50 GPa) for nc-TiN/a-BN and nc-TiN/a-BN/a-TiB 2 coatings was achieved when TiN grains (25-30 and ≤10 nm, correspondingly) were separated by near-monoatomic layers of a-BN [31]. Doping of CrN by boron produces two types of nanocomposite structures: nc-CrN/a-BN [28,32] and nc-CrB2/a-BN [33]. Seventeen to 43 GPa hardness was reported for Cr-B-N coatings [34][35][36][37][38][39].…”