Abstract:In this paper, the nanolamination of a ZrO2 insulator by Al2O3 for metal insulator metal capacitor applications has been studied. The insulating layers (ZrO2 and Al2O3) were deposited by atomic layer deposition and the electrodes were made of TiN. Different configurations of ZrO2 and Al2O3 alternations were studied, including 1 to 16 Al2O3 inclusions in the ZrO2 layer. X-ray diffraction of the insulator configurations showed that with four or more Al2O3 inclusions, the structure loses its crystalline orientati… Show more
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