Abstract:We present our recent findings on the strong gettering effect of dielectric films for removing impurities from the silicon bulk. Iron was used as a model impurity in silicon to study the gettering effects. The iron concentration in silicon is found to be significantly reduced after annealing silicon wafers coated with either plasma-enhanced chemical vapour deposited (PECVD) silicon nitride (SiN x) films, or atomic layer deposited (ALD) aluminium oxide (Al 2 O 3) films. Both PECVD SiN x coated and ALD Al 2 O 3 … Show more
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