Atomic steps, a defect common to all crystal surfaces, can play an important role in many physical and chemical processes. However, attempts to predict surface dynamics under nonequilibrium conditions are usually frustrated by poor knowledge of the atomic processes of surface motion arising from mass transport from/to surface steps. Using low-energy electron microscopy that spatially and temporally resolves oxide film growth during the oxidation of NiAl(100) we demonstrate that surface steps are impermeable to oxide film growth. The advancement of the oxide occurs exclusively on the same terrace and requires the coordinated migration of surface steps. The resulting piling up of surface steps ahead of the oxide growth front progressively impedes the oxide growth. This process is reversed during oxide decomposition. The migration of the substrate steps is found to be a surface-step version of the well-known Hele-Shaw problem, governed by detachment (attachment) of Al atoms at step edges induced by the oxide growth (decomposition). By comparing with the oxidation of NiAl(110) that exhibits unimpeded oxide film growth over substrate steps we suggest that whenever steps are the source of atoms used for oxide growth they limit the oxidation process; when atoms are supplied from the bulk, the oxidation rate is not limited by the motion of surface steps.oxidation | NiAl | surface steps S urface growth processes are often treated with a simplifying assumption that the substrate is immobile. The rationale behind this general belief is that the role of the rigid substrate is to serve as a structural template, guiding the arrangement of impinging atoms. However, many surface growth processes involve reaction with the substrate (i.e., require sources or sinks of substrate atoms). In such cases, the role of the metallic substrate goes far beyond that of a passive support because of its active participation in the growth process. Such surface growth processes are typified by the oxidation of metals, during which the interaction between oxygen and a metallic substrate results in oxide growth by consuming the substrate atoms. Although extensive interest in understanding surface oxidation has existed for decades owing to its critical role in many technological processes including high-temperature corrosion, heterogeneous catalysis, and thin film processing, many issues are still unresolved, particularly those concerning the early stages of oxidation. A detailed understanding of the initial oxidation processes of surfaces has always been complicated by overwhelming inhomogeneities owing to high density of defects. Atomic steps are present on virtually any crystalline material in any environment and serve as natural sources and sinks of substrate atoms owing to the reduced coordination of atoms at step sites. In this work we address oxidation-induced surface dynamics as a result of mass transfer from and to steps. This is a critical issue because it influences both the mechanism and kinetics of the surface physical and chemical pro...