The fabrication of flip-covered plasmonic nanostructure surfaces with enhanced wear resistance

Multiple-Route Exciton Recombination Dynamics and Improved Stability of Perovskite Quantum Dots by Plasmonic Photonic Crystal

“…The photonic Ag nanotip array was fabricated using a bilayer UV nanoimprint lithography (NIL) and lift-off process. , The fabrication scheme of the Ag nanotip array is shown in Figure a. The hexagonal-arrayed nanohole Si master with a diameter of 150 nm, interval of 300 nm, and depth of 150 nm was fabricated following our previous work. , A lift-off resist of LOR5A (MicroChem) with a thickness of 500 nm was spin-coated on a 2 in. glass wafer, followed by the spin-coating of a UV curable silicon-based NIL resist (LV400, Chemoptics).…”

“…The hexagonal-arrayed nanohole Si master with a diameter of 150 nm, interval of 300 nm, and depth of 150 nm was fabricated following our previous work. 29,40 A lift-off resist of LOR5A (MicroChem) with a thickness of 500 nm was spincoated on a 2 in. glass wafer, followed by the spin-coating of a UV curable silicon-based NIL resist (LV400, Chemoptics).…”

Dual nanotransfer printing for complementary plasmonic biosensors

“…The dual NTP process starts with the preparation of a hexagonal nanohole-type polyurethane-acrylate (PUA) mold replicated twice using a silicon (Si) master. The hexagonal nanohole-type Si master with a diameter of 150 nm, period of 300 nm, and depth of 100 nm was prepared according to our previous works [30,31]. A thin Au layer with 20 nm thickness was deposited on the PUA nanohole-type mold using an e-beam evaporator under the condition of minimized side wall deposition, as shown in figure 1(a).…”

“…To overcome additional subsequent processes issue, nanotransfer printing (NTP), wherein a metal layer deposited on the convex parts of a soft polymer mold is transferred to a substrate based on the difference in the bonding strength of the metal/mold and metal/substrate interfaces [28][29][30][31], is another promising nanolithography method for fabricating plasmonic nanostructures.…”

Eight Inch Wafer-Scale Flexible Polarization-Dependent Color Filters with Ag–TiO2 Composite Nanowires

“…Nanostructured color filters have consistently been the focus of investigation because of their applications in digital displays, − high-resolution color printing, , anticounterfeiting, and information encoding. , Various types of nanostructures based on plasmonic materials such as Ag, Au, and Al have been studied to achieve diverse spectral filters. − With the development of nanofabrication technologies, color generation has been achieved by the use of diverse methods, including surface plasmons and the interaction of light with metallic nanostructures, − subwavelength hole arrays in metal films, − metal/insulator/metal nanoresonators, − and plasmonic nanostructure of various designs. − Numerous studies have demonstrated the improvement of transmission through thick metal films by the use of arrays with subwavelength-size holes, such as nanopatches, nanoparticle arrays, and nanodisks. − So far, researchers have mainly focused on the development of one fixed color for the formatting of color filters. These designs are based on the use of incident white light-based nanopatterning and are limited to the fabrication of hard and microsized substrates.…”