The Efficiency Study of Graphene Synthesis on Copper Substrate via Chemical Vapor Deposition Method with Methanol Precursor

Abstract

Few-layer graphene was successfully synthesized on copper foil via chemical vapor deposition with methanol as a carbon source. This was confirmed by optical microscopy observation, Raman spectra measurement, I2D/IG ratio calculation, and 2D-FWHM value comparisons. Monolayer graphene was also found in similar standard procedures, but it required higher growth temperature and longer time periods. The cost-efficient growth conditions for few-layer graphene are thoroughly discussed via TEM observation and AFM measurement. In addition, it has been confirmed that the growth period can be shortened by increasing growth temperature. With the H2 gas flow rate fixed at 15 sccm, few-layer graphene was synthesized at the lower growth temperature of 700 °C in 30 min, and at 900 °C growth temperature in only 5 min. Successful growth was also achieved without adding hydrogen gas flow; this is probably because H2 can be induced from the decomposition of methanol. Through further defects study of few-layer graphene via TEM observation and AFM measurement, we tried to find possible ways for efficiency and quality management in graphene synthesis in industrial applications. Lastly, we investigated graphene formation after pre-treatment with different gas compositions, and found that gas selection is a crucial factor for a successful synthesis.

Crystallization of Copper Films on Sapphire Substrate for Large-Area Single-Crystal Graphene Growth

“…To obtain single-layer graphene of a large area and high quality by chemical vapor deposition (CVD), in addition to the synthesis process itself, the surface on which the nucleation of the carbon film begins is important. One of the most efficient ways to grow an ideal graphene monolayer is to use a smooth single-crystal bulk copper [ 1 , 2 , 3 ]. However, this approach is technologically difficult to implement and scale since it requires the purchase of expensive single-crystal copper.…”

Development of a Simple Electroless Method for Depositing Metallic Pt-Pd Nanoparticles over Wire Gauge Support for Removal of Hydrogen in a Nuclear Reactor

“…[1][2][3][4][5][6][7][8][9][10]. These include thermal deposition [11,12], sonication [13,14], UV irradiation [15,16], microwave [17,18], sputter coating [19,20], chemical vapor deposition [21,22], electrochemical plating [23,24] and electroless plating [25,26], etc. Although thermal deposition, sputter coating, and chemical vapor deposition provide excellent control over film composition, thickness, and structure, they suffer from high cost (expensive high vacuum equipment is required) and low yield.…”