The effects of thickness on magnetic properties of FeCuNbSiB sputtered thin films

Abstract

Abstract. Thin lms of Fe 73:1 Cu 1 Nb 3:1 Si 14:7 B 8:2 alloy with 200, 500, and 800 nm thicknesses have been deposited by RF sputtering. Their magnetic properties have been characterized using Alternating Gradient Field Magnetometer (AGFM) and Vibrating Sample Magnetometer (VSM). The e ects of residual stresses investigated by nanoindentation experiments were conducted on the as-deposited samples. It is observed that the coercivity of as-deposited lms is inversely proportional to the thickness in relation with the residual stress induced during sputtering.