2007
DOI: 10.1109/tns.2007.909022
|View full text |Cite
|
Sign up to set email alerts
|

The Effects of Proton and X-Ray Irradiation on the DC and AC Performance of Complementary (npn + pnp) SiGe HBTs on Thick-Film SOI

Abstract: The impact of 63.3 MeV proton and 10 keV x-ray irradiation on the DC and AC performance of complementary ( + ) SiGe HBTs on thick-film SOI is investigated. Proton and x-ray induced changes in the forward and inverse Gummel characteristics, the output characteristics, and avalanche multiplication are reported for both npn and pnp SiGe HBTs, at both room temperature (300 K) and at cryogenic temperatures (down to 30 K). Comparison of room temperature and cryogenic data suggests interface trap formation at two dis… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
6
0

Year Published

2009
2009
2024
2024

Publication Types

Select...
6

Relationship

1
5

Authors

Journals

citations
Cited by 18 publications
(6 citation statements)
references
References 23 publications
0
6
0
Order By: Relevance
“…Ionization damages create some positive oxide trapped charges and interface states around the EB spacer oxide layer, which act as generation-recombination (G-R) centers and increase the base surface recombination current in the low V BE region. [12][13][14][15] Displacement damages are induced by the collision between incoming particles and atoms in the semiconductor lattice. When the swift heavy ion passes through the semiconductor material, the lattice atoms will deviate from their original position.…”
Section: Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…Ionization damages create some positive oxide trapped charges and interface states around the EB spacer oxide layer, which act as generation-recombination (G-R) centers and increase the base surface recombination current in the low V BE region. [12][13][14][15] Displacement damages are induced by the collision between incoming particles and atoms in the semiconductor lattice. When the swift heavy ion passes through the semiconductor material, the lattice atoms will deviate from their original position.…”
Section: Resultsmentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8] The special device structure and unique band gap engineering in the base enable SiGe HBTs to have a wide temperature range capability and multi-Mrad total ionizing dose (TID) tolerance without hardening. [9][10][11][12][13] As a result, SiGe HBTs gain significant attention as a candidate in extreme environment applications, especially in radiation-rich space explorations. Therefore, it is essential to explore the irradiation characteristics and underlying damage mechanisms in SiGe HBTs and related circuits to find suitable hardening strategies for practical applications.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Performed under the standard test procedure, virtually no degradation in collector current ( ) post-exposure [3], [4] is observed, whereas the base current ( ) typically shows a near slope leakage component in the base current. A typical pre-irradiation and post-irradiation Gummel characteristic is shown in Fig.…”
mentioning
confidence: 99%
“…1 to illustrate. Many studies have been focused on the degradation of base current, since it affects common device figures-of-merit such as current and RF gain [4].…”
mentioning
confidence: 99%