In this paper, Taguchi L 18 orthogonal array have been employed for depositing the electro-conductive coatings by varying various process parameters, i.e., substrate material, type of powder feeding arrangement, stagnation gas temperature, stagnation gas pressure, and stand-off distance. The response parameter of the coatings so produced is measured in terms of surface roughness. The optimum process parameters are predicted on the basis of analyses (ANOVA) of the raw data and signal to noise ratio. The significant process parameters in order of their decreasing percentage contribution are: stagnation pressure, stand-off distance, substrate material, stagnation temperature of the carrier gas, and feed arrangement of the powder particles, respectively.