1996
DOI: 10.1016/0921-4526(95)00892-6
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The effects of annealing on the AC electrical properties of cobalt phthalocyanine thin films

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Cited by 24 publications
(15 citation statements)
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“…The value for activation energy of charge carriers calculated at TϽ180 K falls within the range of 14 -25 meV, thereby providing further evidences for the existence of a hopping type conduction mechanism. Although, this value is somewhat higher than the activation energy value of 12 meV for thin films of PbPc, 14 20 At temperatures above 210 K a transition on the conduction mechanism occurs. Activation energy values obtained from this region vary from 160 to 50 meV.…”
Section: Ac Conductivity As a Function Of Temperaturementioning
confidence: 55%
See 2 more Smart Citations
“…The value for activation energy of charge carriers calculated at TϽ180 K falls within the range of 14 -25 meV, thereby providing further evidences for the existence of a hopping type conduction mechanism. Although, this value is somewhat higher than the activation energy value of 12 meV for thin films of PbPc, 14 20 At temperatures above 210 K a transition on the conduction mechanism occurs. Activation energy values obtained from this region vary from 160 to 50 meV.…”
Section: Ac Conductivity As a Function Of Temperaturementioning
confidence: 55%
“…Similar observations have been reported for thin films of CoPc. 20 The observed increase of capacitance with temperature, and the subsequent decrease with frequency, may be qualitatively explained by the equivalent circuit model developed by Goswami and Goswami 27 for ZnS films employing ohmic contacts. According to this model the measured capacitance (C S ) is given by…”
Section: Capacitance As a Function Of Frequency And Temperaturementioning
confidence: 99%
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“…electric field at the metal insulator interface varies with the insulator over the region. AC conductivity and dielectric measurements of metal phthalocyanine were the subject of several investigations in the last decades [5][6][7][8][9][10][11]. The data were analyzed within the frame of the 'universal' power law ∝ ω s .…”
Section: Introductionmentioning
confidence: 99%
“…Root mean square (RMS) roughness was calculated at 6.37 and 20.8 nm before and after annealing, respectively. Almost threefold increase of RMS roughness is probably caused by the presence of oxygen during the annealing process [17,18].…”
Section: Resultsmentioning
confidence: 99%